调制周期与调制比对Cu/Nb纳米多层膜结构和性能的影响  

Influence of Modulation Period and Ratio on Structures and Properties of Cu/Nb Nanoscale Multilayers

作　　者：郭中正 闫万珺 张殿喜 杨秀凡 蒋宪邦 周丹彤 Guo Zhongzheng;Yan Wanjun;Zhang Dianxi;Yang Xiufan;Jiang Xianbang;Zhou Dantong(School of Electronics and Information Engineering,Anshun University,Guizhou,561000)

机构地区：[1]安顺学院电子与信息工程学院,贵州561000

出　　处：《当代化工研究》2024年第6期45-48,共4页Modern Chemical Research

基　　金：贵州省教育厅青年科技人才成长项目“非混溶体系铜-钨薄膜结构均质化机理及力学行为研究”(项目编号:黔教合KY字[2019]145号)。

摘　　要：为研究调制周期λ和调制比η对Cu/Nb纳米多层膜结构和性能的影响,用磁控溅射沉积Cu/Nb多层膜,λ=30~150 nm,η=1、1.5及2。多层膜微观结构与形貌用X射线衍射仪、扫描电镜及原子力显微镜分析,性能用微力拉伸仪、纳米压痕仪及四探针仪测试。结果表明,Cu/Nb多层膜的结构和性能受控于λ和η。Cu和Nb层分别呈Cu(111)和Nb(110)织构,且均为纳米晶结构。在Cu/Nb界面处,Cu扩散进入Nb层。表面Cu层颗粒尺寸随Cu层增厚而增大。随λ或η减小,Cu/Nb多层膜的屈服强度σ_(0.2)、显微硬度H和电阻率ρ都呈增加趋势。而裂纹萌生临界应变ε_(c)则与1/λ或η呈正相关。In order to study the influences of modulation periodλand modulation ratioηon structures and properties of Cu/Nb nanoscale multilayers,Cu/Nb multilayers withλ=30~150 nm,η=1,1.5 and 2 were deposited by magnetron sputtering.The microstructure and morphology of multilayers were analyzed by X-ray diffractor,scanning electron microscope,and atomic force microscope.The properties were tested using micro force tension tester,nano-indenter,and four-point probe.The results show that the structures and properties of Cu/Nb multilayers are controlled byλandη.The Cu and Nb layers exhibit Cu(111)and Nb(110)textures,respectively,and both are nanocrystalline structures.At the Cu/Nb interface,Cu diffuses into the Nb layer.The particle size of the uppermost Cu layer increases with the increasing Cu layer thickness.The yield strength σ_(0.2),micro-hardness H and electrical resistivityρof multilayers all show an increasing trend with withλorηdecreases.The critical strain of crack initiationεc is correlated positively with 1/λ or η.

关 键 词：Cu/Nb纳米多层膜 调制周期 调制比 屈服强度 显微硬度 电阻率 

分 类 号：TG146.1[一般工业技术—材料科学与工程] TG146.4[金属学及工艺—金属材料]