Plasma-etching on monolithic MOFs-based MIM filter boosted chemical sensing  

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作  者:Jianxi Liu Li Feng Zhihuan Li Yang Wu Feng Zhou Yadong Xu 

机构地区:[1]Research&Development Institute,Northwestern Polytechnical University in Shenzhen,Shenzhen 518057,China [2]State Key Laboratory of Solidification Processing,Center of Advanced Lubrication and Seal Materials,School of Materials Science and Engineering,Northwestern Polytechnical University,Xi’an 710072,China [3]Yantai Zhongke Research Institute of Advanced Materials and Green Chemical Engineering,Shandong Laboratory of Advanced Materials and Green Manufacturing at Yantai,Yantai 264006,China [4]State Key Laboratory of Solid Lubrication,Lanzhou Institute of Chemical Physics,Chinese Academy of Sciences,Lanzhou 730000,China

出  处:《Nano Research》2024年第4期2800-2807,共8页纳米研究(英文版)

基  金:support from the National Natural Science Foundations of China(No.52071270);the Science Fund of Shandong Laboratory of Advanced Materials and Green Manufacturing(Yantai)(No.AMGM2023F03);Guangdong Basic and Applied Basic Research Foundation(No.2021A1515410006);the Research Fund of the State Key Laboratory of Solidification Processing(NPU)(No.2022-QZ-04).

摘  要:Metal-insulator-metal(MIM)cavity as a lithography-free structure to control light transmission and reflection has great potential in the field of optical sensing.However,the dense top metal layer of the MIM prohibits any external medium from entering the dielectric insulation layer,which limits the application of the cavity in the sensing field.Herein,we demonstrate a series of monolithic metal-organic frameworks(MOFs)based MIM cavities,which are treated by plasma etching to provide channels for chemical diffusion and to advance sensing.We modulate the bandwidth of the MIM filters by controlling the MOF thickness as insulator layers.Oxygen plasma-etching is applied to build channels on the top metal layer without altering their saturation and brightness for chemical sensing performance.The etching time regulates the number and size of channels on the top metal layer.Sensing behavior is demonstrated on the plasma-etched MOFs-based MIM cavity when external chemicals diffuse in the cavity.In addition,we generate patterned structure of the MOFs-based MIM cavity via plasma-mask method,which can transfer to different substrates and produce a controllable structure color change for chemical sensing.Our MIM cavity may promote the advancement and applications of structural color in security imaging,color display,information anticounterfeiting,and color printing.

关 键 词:metal-organic frameworks(MOFs) SPIN-COATING metal-insulator-metal FILTER patterns sensing 

分 类 号:O53[理学—等离子体物理]

 

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