机构地区:[1]华中科技大学材料科学与工程学院,材料成形与模具技术国家重点实验室,武汉430074 [2]湖北大学,铁电压电材料与器件湖北省重点实验室,武汉430062 [3]中国科学院近代物理研究所,兰州重离子加速器国家实验室,兰州450008 [4]西安交通大学,电子陶瓷与器件教育部重点实验室,西安710049 [5]广东华中科技大学工业技术研究院,广州东莞523808
出 处:《硅酸盐学报》2024年第4期1365-1373,共9页Journal of The Chinese Ceramic Society
基 金:国家自然科学基金(52202133);广东省基础与应用基础研究基金(2023A1515010373);广东省制造装备数字化重点实验室(2020B1212060014);东莞市引进创新科研团队计划(2020607101007);东莞市重点研发计划(20221200300032);中国科学院战略性先导科技专项(XDC10020202);湖北省自然科学基金创新群体项目(2022CFA031)。
摘 要:由于薄膜电容器具有低极性,绝缘阻抗高,频率响应宽等优点,具有旁路、去耦、滤波和储能的功能,广泛应用于通信、电子、航空航天、医疗设备、新能源等行业。近年来,由于行业的发展,低介电损耗、高击穿场强与高能量密度的新型介电材料的研发变得愈发重要。采用氙重离子束对聚(偏二氟乙烯–六氟丙烯)进行辐照改性,系统地研究了辐照注量对材料微观结构、介电性能和储能性能的影响。结果表明,^(129)Xe^(27+)快重离子辐照促进了优势相变与表面交联结构形成,提高了材料的储能效率与击穿场强。同时,辐照断键提高了材料的介电常数,增强了有效极化。多种效应协同作用下,成功制备了高击穿场强(540 MV/m)、高放电能量密度(16.3 J/cm^(3))的辐照改性聚合物材料,为促进聚合物介质电容器的发展提供了理论与实验依据。Introduction The innovative development of advanced energy storage devices is imminent due to the continuous depletion of non-renewable energy sources and the increase in energy demand.Compared with other energy storage devices,film capacitors have some advantages of high power density,low polarity,high insulation impedance and wide frequency response,which are a recent research hotspot.Meanwhile,film capacitors have the functions of bypass,decoupling,wave filtering and energy storage,etc.,which are widely used in communication,electronics,aerospace,medical equipment,new energy and other industries.Recent investigation on new dielectric materials with a low dielectric loss,a high breakdown strength and a high energy density becomes popular.In this paper,poly(vinylidene fluoride–hexafluoropropylene)(P(VDF–HFP))was modified via irradiation using a xenon heavy ion beam,and the effect of irradiation injection on the microstructure,dielectric properties and energy storage properties of the materials were investigated.The mechanism of intrinsic structure evolution by novel irradiation modification technology was discussed.Methods P(VDF–HFP)was first dissolved in N,N-Dimethylformamide(DMF)and stirred in a water bath for 24 h to obtain a homogeneous solution.The solution was then flowed onto a quartz glass substrate and cast with a spatula to form a P(VDF–HFP)liquid film.It was dried in a vacuum drying oven at 0.08 MPa and 80℃for 24 h to evaporate the solvent.The films were heated at 120℃for 12 h to completely remove the solvent residue.The cast film was peeled off from the glass substrate in alcohol and dried to obtain an untreated flexible polymer dielectric film.The pure film was slit and then vertically irradiated with a beam of xenon ions(^(129)Xe^(27+))of a mononuclear energy of 19.5 MeV/u at an irradiation injection of 5×10^(6),5×10^(7),5×10^(8),5×10^(9),and 5×10^(10) ions/cm^(2),respectively.The six irradiation gradient samples were washed,dried and stored for subsequent analysis.The crystal form
分 类 号:TM215[一般工业技术—材料科学与工程]
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