10 kV与20 kV系统在半导体项目上的设计要点分析  

10 kV and 20 kV Technology Analysis of Semiconductor Field

作　　者：李伟杰 LI Weijie(China Electronics System Engineering No.2 Construction Co.,Ltd.,Shanghai 214000)

机构地区：[1]中国电子系统工程第二建设有限公司,上海214000

出　　处：《电子工业专用设备》2024年第2期20-26,共7页Equipment for Electronic Products Manufacturing

摘　　要：半导体作为国家目前发展的重点,新建了很多200 mm(8英寸)和300 mm(12英寸)的半导体项目,而半导体项目自身又具有高用电需求的特点,所以针对10 kV和20 kV不同电压等级对技术要点进行分析和研究是十分必要。分别对10 kV和20 kV的电力系统方案进行分析,并对短路电流计算进行理论试算,归纳所对应的设备选型所对应参数,并结合实际案例分析比较所对应的站房需求和结构柱网型式,最终得出两种电压等级下所对应的设计要点,为其他设计人员在后续设计中提供借鉴。Semiconductor field regard as China key industry,currently 200 mm(8-inch)and 300 mm(12-inch)wafer production line have been established with characteristic of high power demand,therefore it is necessary to study with 10 kV and 20 kV technology.The article analyzes the power system of 10 kV and 20 kV respectively combined with short-circuit current calculation,summarizes the parameter selection and compares the corresponding space needs and structural column grid types with actual case analysis.Finally get the conclusion corresponding to two voltage.

关 键 词：电压等级 半导体 短路电流 设计要点 

分 类 号：TN302[电子电信—物理电子学]