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作 者:郭宣莹 顾莉莉 王娟[1,2] 石建军 郭颖[1,2,3] GUO Xuanying;GU Lili;WANG Juan;SHI Jianjun;GUO Ying(College of Science,Donghua University,Shanghai,China;Key Laboratory of Advanced Plasma Physics and Technology in Textile Industry,Donghua University,Shanghai,China;Member of Magnetic Confinement Fusion Research Center,Donghua University,Shanghai,China)
机构地区:[1]东华大学理学院,上海 [2]东华大学纺织行业先进等离子体物理与技术重点实验室,上海 [3]东华大学磁约束核聚变教育部研究中心,上海
出 处:《东华大学学报(自然科学版)》2024年第2期107-112,共6页Journal of Donghua University(Natural Science)
基 金:国家自然科学基金面上项目(12175036,11875104)。
摘 要:大气压脉冲介质阻挡放电射流等离子体中,羟基活性粒子的生成和调控对于等离子体在材料表面改性方面的应用具有重要意义,而羟基活性粒子的形成和调控又与放电结构密切相关。研究了接地电极宽度对大气压脉冲放电射流等离子体的影响:通过改变接地电极宽度,探究其对射流长度、放电强度的影响;通过增强型电荷耦合器件(ICCD)对放电时空演化进行分析;通过发射光谱分析放电产生的特征谱线。结果表明:当接地电极的宽度为1.5 cm时,射流长度最长;在射流3 mm处,有较强的羟基活性粒子浓度。利用大气压脉冲射流等离子体处理涤纶织物表面,验证了气相等离子体中羟基含氧基团与涤纶表面亲水处理效果的正相关性,为等离子体中活性粒子的控制和开发工业用等离子体源提供了参考。The generation and regulation of hydroxyl active particles in pulsed dielectric barrier plasma jet discharge is of great importance for the application of plasma in material surface modification,and the formation and regulation of hydroxyl active particles are closely related to the discharge structure.Therefore,the effect of ground electrode width on the plasma of atmospheric pressure pulsed discharge jet was investigated,and its effect on the jet length,discharge intensity was explored by varying the ground electrode width,and the spatial and temporal evolution of the discharge was analyzed by an enhanced charge-coupled device(ICCD);the characteristic spectral lines generated by the discharge were analyzed by emission spectroscopy.The results show that the jet length is the longest when the width of the grounded electrode is 1.5 cm;there is a strong concentration of hydroxyl active particles at 3 mm of the jet.And the positive correlation between the hydroxyl oxygen-containing groups in the gas-phase plasma and the hydrophilic treatment results of polyester surface was verified by using atmospheric pressure pulsed jet plasma to treat the polyester fabric surface,which provides a reference for the control of active particles in the plasma and the development of industrial plasma sources.
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