基于PIC-MCC实现空气介质阻挡放电过程的数值模拟  

The Process of Dielectric Barrier Discharge in Air Simulated by PIC-MCC Method at Atmospheric Pressure

作　　者：赵晓宁 赵来军[1,2] 孟声辉 余诚诚 孙岩洲 ZHAO Xiaoning;ZHAO Laijun;MENG Shenghui;YU Chengcheng;SUN Yanzhou(School of Electrical Engineering and Automation,Henan Polytechnic University,Jiaozuo 454003,China;Henan Key Laboratory of Intelligent Detection and Control of Coal Mine Equipment,Jiaozuo 454003,China)

机构地区：[1]河南理工大学电气工程与自动化学院,焦作454003 [2]河南省煤矿装备智能检测与控制重点实验室,焦作454003

出　　处：《真空科学与技术学报》2024年第4期361-368,共8页Chinese Journal of Vacuum Science and Technology

基　　金：河南理工大学博士基金项目(B2016-21)。

摘　　要：在大气压介质阻挡放电的实际应用中,空气介质阻挡放电具有极其广泛的工业化应用前景。目前,空气均匀放电的获得仍比较困难,且诊断均匀性的依据缺乏可信的依据。文章采用粒子云网格法(Particle in Cell,PIC)与蒙特卡罗碰撞(Monte Carlo Collision,MCC)方法模拟了放电过程中粒子的运动情况,研究大气压下空气介质阻挡放电的发展过程,然后讨论介质厚度、电源频率对形成均匀放电的影响,并研究这两种因素对等离子体密度的影响。模拟结果表明:介质厚度在d≥1.5 mm时可获得没有放电细丝的电流波形;电源频率高于2.5 kHz时,放电细丝是难以避免的。在能够形成均匀放电的条件下,将介质厚度适当的调整在1.5 mm附近,提高电源频率,将产生更高的等离子体密度。In the practical application of atmospheric pressure dielectric barrier discharge,air dielectric barrier discharge has an extensive industrial application prospect.At present,it is still difficult to obtain the uniform discharge of air,and there is still no uniform basis for the diagnosis of uniformity.In this paper,particle in cell(PIC)and Monte Carlo collision(MCC) methods are used to simulate the motion of particles in the discharge process,and the development process of air dielectric barrier discharge under atmospheric pressure is studied.Then,the influence of dielectric thickness and power supply frequency on uniform discharge is discussed,and the influence of these two factors on the generated plasma density is studied.The simulation results show that the current waveform without discharge filaments can be obtained when the thickness of the medium is d≥1.5 mm.When the power supply frequency is higher than 2.5 kHz,discharge filaments are difficult to avoid.Under the condition that uniform discharge can be formed,the medium thickness is appropriately adjusted around 1.5 mm,and the power supply frequency is increased,which will produce higher plasma density.

关 键 词：介质阻挡放电 PIC-MCC法 空气放电 

分 类 号：TB43[一般工业技术]