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作 者:薛志萍 陆静 毛现艳[1,2] 黄身桂 郭桦[1,2] XUE Zhiping;LU Jing;MAO Xianyan;HUANG Shengui;GUO Hua(Institute of Manufacturing Engineering,Huaqiao University,Xiamen 361021,China;National and Local Joint Engineering Research Center for Intelligent Manufacturing Technology of Brittle Material Products,Huaqiao University,Xiamen 361021,China;Fujian Provincial Key Laboratory of Biomass Low-Carbon Conversion,Huaqiao University,Xiamen 361021,China)
机构地区:[1]华侨大学制造工程研究院,福建厦门361021 [2]华侨大学脆性材料产品智能制造技术国家地方联合工程研究中心,福建厦门361021 [3]华侨大学生物质低碳转化福建省高校重点实验室,福建厦门361021
出 处:《华侨大学学报(自然科学版)》2024年第3期303-313,共11页Journal of Huaqiao University(Natural Science)
基 金:国家自然科学基金资助项目(51975222,51835004);福建省自然科学基金资助项目(2021J06027);华侨大学先进碳转化技术研究院开放基金(2023年度)。
摘 要:以304不锈钢为基体,采用电泳共沉积法制备复合涂层,并通过烧结方式实现涂层在基体的固化。研究电泳共沉积过程中不同悬浮液组成、沉积电压、沉积时间和Al^(3+)质量分数等因素对涂层性能的影响,对涂层进行微观结构表征和力学性能测试,并使用该工艺制备抛光盘,用于蓝宝石的抛光。结果表明:当沉积电压为50 V,沉积时间为6 min,添加质量分数为0.10%的Al^(3+)时,可获得光滑、均匀的金刚石/Al_(2)O_(3)/玻璃复合涂层;复合涂层经450℃烧结3 h后,表面致密均匀,硬度达521 HV,复合涂层的耐磨性、与基体的结合强度均良好;使用抛光盘对蓝宝石进行抛光,可将表面粗糙度降低90.2%。Diamond/Al_(2)O_(3)/glass composite coating was prepared by electrophoretic co-deposition method on 304 stainless steel substrate,and curing of the coating on the substrate was realized through sintering method.The influence of suspension compositions,deposition voltage,deposition time and mass fraction of Al^(3+)on the coating properties during the electrophoretic co-deposition process was investigated.Microstructure characterization and mechanical property testing of the prepared coating were carried out,and polishing discs were prepared using this process for polishing sapphire substrate.The results showed that smooth and uniform diamond/Al_(2)O_(3)/glass composite coating was obtained when the deposition voltage was 50 V,the deposition time was 6 min and Al^(3+)with mass fraction of 0.10%was added.The composite coating had a dense and uniform surface with a hardness of 521 HV after being sintered at 450℃for 3 h,it also exhibited excellent abrasion resistance and bond strength with the substrate.The surface roughness of sapphire substrate was reduced by 90.2%after polishing using the prepared polishing discs.
分 类 号:TB332[一般工业技术—材料科学与工程]
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