基于4.0~4.8μm红外增透截止滤光片的研制  

Preparation of Cut-off Filter of Infrared Penetration Based on 4.0~4.8μm

作　　者：张翔 张薇 ZHANG Xiang;ZHANG Wei(Shanxi Huaxing Electronics Group Co.,Ltd.,Xianyang,China)

机构地区：[1]陕西华星电子集团有限公司,陕西咸阳

出　　处：《光电技术应用》2024年第2期21-26,共6页Electro-Optic Technology Application

摘　　要：详细阐明了干涉滤光片中截止滤光片膜系的设计理论、设计步骤和相关重要公式,并从实际应用出发,阐述了4.0~4.8μm红外增透截止滤光片的设计过程。通过现代膜系设计软件优化提升了膜层性能,最终制备出了达到设计指标要求的滤光片。外增透截止滤光片在截止带1.6~3.5μm平均透过率≤3.5%,透射带4.0~4.8μm平均透过率≥90%,滤光片膜层能耐受从-190℃~60℃温度冲击,显示了设计的准确性和制备工艺的可行性。The design theory,design steps and related important formula of the cut-off filter membrane of interference filter are illustrated in detail,and from the practical application,the 4.0~4.8μm infrared penetration cut-off filter design process is expounded.Through the modern membrane design software optimization,the membrane layer performance is improved,and the filter to meet the requirements of the design index is prepared.The mean transmissivity of the infrared cut-off filter is less than 3.5% at 1.6~3.5μm cut-off band,is more than 90% at 4.0~4.8μm cut-off band,and the filter layer can withstand temperature shocks from-190℃ to 60 C,showing the accuracy of the design and the feasibility of the preparation process.

关 键 词：红外增透 干涉滤光片 截止滤光片 耐温度冲击 膜系设计与工艺 

分 类 号：TN214[电子电信—物理电子学]