中国环流三号(HL-3)壁处理系统研制  

Research and Development on Wall Conditions of HL-3

作　　者：曹诚志 颉延风 胡毅 黄向玫 崔成和 乔涛 周军 蔡潇 高霄雁 赵鹏 曹曾 CAO Chengzhi;XIE Yanfeng;HU Yi;HUANG Xiangmei;CUI Chenghe;QIAO Tao;ZHOU Jun;CAI Xiao;GAO Xiaoyan;ZHAO Peng;CAO Zeng(Southwestern Institute of Physical,Chengdu 610025,China)

机构地区：[1]核工业西南物理研究院,成都610025

出　　处：《真空与低温》2024年第3期325-330,共6页Vacuum and Cryogenics

基　　金：国家重点研发计划(2018YFE0303101)。

摘　　要：托卡马克装置壁处理系统对获得高真空、洁净的器壁条件至关重要。介绍了中国环流三号(HL-3)装置真空系统中的壁处理各子系统设计及研制概况。分析了壁处理系统调试运行过程和特点,设计了烘烤系统和直流辉光清洗系统的运行方案。分别对烘烤系统、直流辉光清洗系统以及射频辅助直流辉光放电系统的首次运行结果进行了讨论。通过应用壁处理系统,配合真空抽气系统,HL-3装置真空系统运行达到预期目标,初始放电前装置最小压力达到2.4×10^(-6)Pa。Wall condition is very important for the ultra vaccum and clean wall in a Tokamak device.The research and development on wall condition subsystems in vacuum system of HL-3 have been introduced.The debugging process and characteristics of wall conditioning are described,and the operational scenarios of baking system and the Glow Discharge Cleaning(GDC)system are designed.The results of baking system,GDC system and radio frequency assisted GDC system are discussed,respectively.By using the developed wall conditioning and pumping system,the vacuum system of the HL-3 device has reached the expected goal.The minimum pressure is 2.4×10^(-6) Pa before first plasma.

关 键 词：中国环流三号 壁处理系统 烘烤系统 直流辉光清洗 射频辅助直流辉光 

分 类 号：TL631[核科学技术—核技术及应用] TB753[一般工业技术—真空技术]