半导体硅片废水处理工艺及应用研究  

Research on the Treatment Process and Application of Semiconductor Wafer Wastewater

作　　者：李宏伟 Li Hongwei(Shoukong Environmental Technology(Shanghai)Co.,Ltd.,Shanghai 200000)

机构地区：[1]首控环境科技(上海)有限公司,上海200000

出　　处：《现代工程科技》2024年第9期65-68,共4页Modern Engineering Technology

摘　　要：为研究半导体硅片废水处理工艺及具体应用,以某企业二期半导体硅片废水处理项目为案例,基于项目实际情况,阐述了半导体硅片废水处理工艺应用、重难点问题及技术措施,包括HUBF水解酸化+HFST好氧工艺(钢制罐体)、前端物化预处理、末端气浮及置换、钢罐内部聚脲防腐等主要方面,最终取得了较为理想的废水处理成效。In order to study the semiconductor silicon wafer wastewater treatment process and its specific application,taking the second phase semiconductor silicon wafer wastewater treatment project of a certain enterprise as a case study,based on the actual situation of the project,the application,key and difficult problems,and technical measures of the semiconductor silicon wafer wastewater treatment process were elaborated,including the HUBF hydrolysis acidification+HFST aerobic process(steel tank body),front-end physical and chemical pretreatment,end gas flotation and replacement,and polyurea anti-corrosion inside the steel tank.Finally,a relatively ideal wastewater treatment effect was achieved.

关 键 词：硅片废水 HUBF水解酸化 HFST好氧工艺 

分 类 号：X76[环境科学与工程—环境工程]