调整彩色滤光膜的致密性和疏水性以减少TFT-LCD制造中的气体释放  

Adjusting the compactness and hydrophobicity of color filters to decrease gas release during TFT-LCD fabrication

作　　者：李吉[1,2,4] 张霞 冯翊 廖昌 张杰 尹勇明 孟鸿 LI Ji;ZHANG Xia;FENG Yi;LIAO Chang;ZHANG Jie;YIN Yong-ming;MENG Hong(School of Materials Science and Engineering,Peking University,Beijing 100871,China;School of Advanced Materials,Shenzhen Graduate School,Peking University,Shenzhen 518055,China;Department of Materials Science,Shenzhen MSU-BIT University,Shenzhen 518172,China;TCL China Star Optoelectronics Technology Co.,Ltd.,Shenzhen 518132,China)

机构地区：[1]北京大学材料科学与工程学院,北京100871 [2]北京大学深圳研究生院新材料学院,深圳518055 [3]深圳北理莫斯科大学材料科学系,深圳518172 [4]TCL华星光电技术有限公司,深圳518132

出　　处：《中国光学（中英文）》2024年第3期704-713,共10页Chinese Optics

基　　金：国家自然科学基金(No.62205058);广东省基础与应用基础研究项目(No.2021A1515110085);深圳市技术攻关项目(No.JSGG20220831103402005)。

摘　　要：TFT-LCD产业正朝着高效率、低成本的方向发展。在TFT-LCD制造过程中,发现不同的光刻胶需要不同的真空干燥时间。为了减少制造时间,提高面板成品率,有必要明确影响真空时间的因素。本文探讨了抽运时间与光刻胶材料性能的关系。发现光刻胶的热稳定性与抽运时间的关系可以忽略不计。光刻胶的致密性和疏水性与真空干燥时间密切相关。致密性和高疏水性可以有效避免水蒸气在制造过程中侵入和储存在光刻胶中,减少泵送次数。总的来说,这项工作可以为未来TFT-LCD工业新型光刻胶的开发提供一定的参考。The TFT-LCD industry is moving towards high efficiency and low costs.During the manufacturing process,it has been found that various photoresists require different vacuum drying times.To reduce manufacturing time and increase panel yields,clarifying the factors that can influence and reduce the vacuum time is necessary.This paper explored the relationship between pumping time and the properties of photoresist materials.It finds that the thermal stability of the photoresist has a negligible relationship with the pumping time.The compactness and hydrophobicity of the photoresist correlated strongly with the vacuum drying time.High compactness and high hydrophobicity can effectively prevent water vapor intrusion and storage in the photoresist during fabrication and consequently reduce pumping times.Overall,this work could guide the future development of new photoresists for the TFT-LCD industry.

关 键 词：液晶显示器 彩色滤光膜 气体释放 致密性 疏水性 

分 类 号：TP394.1[自动化与计算机技术—计算机应用技术] TH691.9[自动化与计算机技术—计算机科学与技术]