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作 者:马创 王振 王新宇 冯增辉 王新礼 刘兰轩 MA Chuang;WANG Zhen;WANG Xinyu;FENG Zenghui;WANG Xingli;LIU Lanxuan(China Academy of Machinery Wuhan Research Institute of Materials Protection Co.,Ltd.,Wuhan 430030,China;China Ship Development and Design Center,Wuhan 430000,China)
机构地区:[1]中国机械总院集团武汉材料保护研究所有限公司,湖北武汉430030 [2]中国舰船研究设计中心,湖北武汉430000
出 处:《材料保护》2024年第6期121-130,138,共11页Materials Protection
摘 要:为获得发射率较低的涂层,多集中在树脂与填料组分的筛选上,而涂层制备过程中的工艺参数对其发射率的影响研究较少,且未对各制备工艺间的相互影响作用进行分析。为此,选择铝粉作为金属填料,氟碳树脂作为黏合剂制备了低红外发射率涂层,先进行单因素试验,调控涂料的黏度(通过改变涂料中稀释剂添加量实现)、涂层的湿膜厚度以及固化温度,分析了3种工艺参数共同作用下对涂层中铝粉排布以及涂层红外发射率的影响。通过响应曲面法进一步分析了各工艺参数相互间的影响,并得到最优工艺参数组合,为涂层的实际制备过程做出指导。结果表明:3种工艺参数对涂层发射率的影响程度依次为涂料黏度>固化温度>湿膜厚度,在稀释剂添加量为78 g,膜层厚度为60μm,固化温度为73℃时,涂层在3~5μm波段的红外发射率为0.141,8~12μm波段的红外发射率为0.177。In order to obtain coatings with low emissivity,most studies focus on the screening of resin and filler components.However,the influence of process parameters on emissivity during the coating preparation process was rarely studied,and the interaction between various preparation processes was not analyzed.In this study,aluminum powder was selected as the metal filler and fluorocarbon resin was selected as the adhesive to prepare a low-infrared emissivity coating.Initially,single-factor experiments were conducted to regulate the viscosity of the coating(achieved by varying the amount of diluent added to the coating),the wet film thickness of the coating and the curing temperature.The combined effects of these three process parameters on the distribution of aluminum powder in the coating and the infrared emissivity of the coating were analyzed and studied.The response surface methodology was used to further analyze the interactions between the process parameters,and the optimal combination of process parameters were determined to guide the actual coating preparation process.Results showed that the influence of the three process parameters on the emissivity of the coating decreased in the order of coating viscosity>curing temperature>wet film thickness.When the addition amount of diluent was 78 g,the film thickness was 60μm,and the curing temperature was 73℃,the infrared emissivity of the coating was 0.141 in the band of 3~5μm and 0.177 in the band of 8~12μm.
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