1064 nm纳秒激光辐照下HfO_(2)/SiO_(2)增透膜损伤的动态过程研究  

Dynamic Damage Process of HfO_(2)/SiO_(2) Anti⁃Reflection Coatings Under 1064 nm Nanosecond Laser Irradiation

作　　者：向程江 刘晓凤[2,3] 陶春先[1] 李大伟[2,3] 赵元安[2,3,4] 徐子媛[2] 帅坤[2] 龚赫 孙建 张伟丽 邵宇川 邵建达[2,3,4,5] Xiang Chengjiang;Liu Xiaofeng;Tao Chunxian;Li Dawei;Zhao Yuan’an;Xu Ziyuan;Shuai Kun;Gong He;Sun Jian;Zhang Weili;Shao Yuchuan;Shao Jianda(School of Optical-Electrical and Computer Engineering,University of Shanghai for Science and Technology,Shanghai 200093,China;Laboratory of Thin Film Optics,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China;Key Laboratory of High Power Laser Materials,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China;Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Sciences,Beijing 100049,China;Hangzhou Institute for Advanced Study,University of Chinese Academy of Sciences,Hangzhou 310024,Zhejiang,China)

机构地区：[1]上海理工大学光电信息与计算机工程学院,上海200093 [2]中国科学院上海光学精密机械研究所薄膜实验室,上海201800 [3]中国科学院强上海光学精密机械研究所激光材料重点实验室,上海201800 [4]中国科学院大学材料科学与光电子工程中心,北京100049 [5]国科大杭州高等研究院,浙江杭州310024

出　　处：《中国激光》2024年第8期60-73,共14页Chinese Journal of Lasers

基　　金：中国科学院国际合作局对外合作重点项目(181231KYSB20210001);上海市“科技创新行动计划”港澳台科技合作项目(22220760300)。

摘　　要：时间分辨的泵浦探测技术是研究光学元件损伤动态过程的有力手段。基于增强电荷耦合器件(ICCD)的时间分辨泵浦探测技术,对比研究了1064 nm纳秒激光辐照下HfO_(2)/SiO_(2)增透膜膜面处于激光入射面(正向过程)和出射面(反向过程)两种情况下的动态损伤过程。在同一能量密度(52 J/cm^(2))激光辐照下,正向和反向过程都产生了无膜层剥落的小坑损伤以及伴随膜层剥落的小坑损伤,但反向过程产生的小坑的横向尺寸和深度都比正向的大。有限元分析结果表明正向和反向过程中增透膜内部的基底-膜层界面场强相似,但实际损伤形貌尺寸以及依据冲击波传播速度计算得到的爆炸能量都表明反向过程沉积的能量更大,可见等离子体形成后在后续激光脉冲辐照下的发展过程决定了两种情况下的损伤差异。增透膜损伤的时间分辨研究对其损伤机制分析以及实际应用具有重要意义。Objective The advancement of high-power lasers poses challenges to the damage resistance of coatings.Currently,studies on coating damage largely rely on offline end-state characterization to understand and infer associated damage processes and mechanisms.However,given the thickness and intricate composition of these coatings,coupled with the exceedingly brief damage process during pulsed laser exposure,establishing a link between the origin of the damage and its ultimate morphology becomes challenging.Antireflection films commonly apply to windows or lenses and are susceptible to damage due to their transmitted electric field.Depending on specific application needs,anti-reflection films position either on the laser entry or exit surface.In this study,the HfO_(2)/SiO_(2) antireflection coating,operating under both conditions,undergoes exposure to a 1064-nm nanosecond laser.By integrating offline endstate characterization with online dynamic process monitoring,the analysis reveals damage traits and mechanisms.This insight aids in refining anti-reflection coating fabrication techniques and their practical use.Methods The output pump beam of an Nd∶YAG laser(wavelength of 1064 nm,pulse width of~10 ns)is vertically focused on the surface of an anti-reflection coating.A continuous probe beam with a wavelength of 532 nm,perpendicular to the pump beam,sweeps across the surface of the anti-reflection coating.An intensified charge-coupled device(ICCD)is combined with an imaging system to detect dynamic damage processes.By adjusting the delay between the ICCD shutter and trigger signal of the pump laser,damage images at different moments are captured,and the entire dynamic damage process is documented.The optical microscope(OM),scanning electron microscope(SEM),and focused ion beam(FIB)are used to characterize the final damage morphologies.Under irradiation with the same laser fluence,the anti-reflection film is located either on the laser incident or exit surface.The damage characteristics of the two irradiation methods a

关 键 词：薄膜 增透膜 激光诱导损伤 时间分辨 等离子体 冲击波 

分 类 号：O484.5[理学—固体物理]