Effect of trace oxygen on plasma nitriding of titanium foil  

作　　者：周海涛 熊希雅 马可欣 罗炳威 罗飞 申承民 Hai-Tao Zhou;Xi-Ya Xiong;Ke-Xin Ma;Bing-Wei Luo;Fei Luo;Cheng-Min Shen(Beijing Institute of Aeronautical Materials,Aero Engine Corporation of China,Beijing 100095,China;Beijing National Laboratory of Condensed Matter Physics,Institute of Physics,Chinese Academy of Sciences,Beijing 100190,China)

机构地区：[1]Beijing Institute of Aeronautical Materials,Aero Engine Corporation of China,Beijing 100095,China [2]Beijing National Laboratory of Condensed Matter Physics,Institute of Physics,Chinese Academy of Sciences,Beijing 100190,China

出　　处：《Chinese Physics B》2024年第6期548-551,共4页中国物理B（英文版）

基　　金：Project supported by the Innovation Funding of Beijing Institute of Aeronautical Materials。

摘　　要：Titanium nitride films are prepared by plasma enhanced chemical vapor deposition method on titanium foil using N_(2) as precursor. In order to evaluate the effect of oxygen on the growth of titanium nitride films, a small amount of O_(2) is introduced into the preparation process. The study indicates that trace O_(2) addition into the reaction chamber gives rise to significant changes on the color and micro-morphology of the foil, featuring dense and long nano-wires. The as-synthesized nanostructures are characterized by various methods and identified as TiN, Ti_(2) N, and TiO_(2) respectively. Moreover, the experiment results show that oxide nanowire has a high degree of crystallinity and the nitrides present specific orientation relationships with the titanium matrix.

关 键 词：NITRIDE OXIDE NANOSTRUCTURE CRYSTALLINE plasma-enhanced chemical vapor deposition system(PECVD) 

分 类 号：O53[理学—等离子体物理]