Specifications and control of spatial frequency errors of components in two-beam laser static holographic exposure for pulse compression grating fabrication  

作　　者：Chen Hu Songlin Wan Guochang Jiang Haojin Gu Yibin Zhang Yunxia Jin Shijie Liu Chengqiang Zhao Hongchao Cao Chaoyang Wei Jianda Shao 

机构地区：[1]Precision Optical Manufacturing and Testing Center,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences(CAS),Shanghai,China [2]Key Laboratory for High Power Laser Material of Chinese Academy of Sciences,Shanghai Institute of Optics and Fine Mechanics,CAS,Shanghai,China [3]Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Sciences,Beijing,China [4]Hangzhou Institute for Advanced Study,University of Chinese Academy of Sciences,Hangzhou,China [5]China-Russian Belt and Road Joint Laboratory on Laser Science,Shanghai,China

出　　处：《High Power Laser Science and Engineering》2024年第1期1-12,共12页高功率激光科学与工程（英文版）

基　　金：supported by the National Key R&D Program of China(2020YFA0714500);the National Natural Science Youth Foundation of China(62205352);the Member of Youth Innovation Promotion Association of the Chinese Academy of Sciences;the International Partnership Program of the Chinese Academy of Sciences(181231KYSB20200040);the Chinese Academy of Sciences President’s International Fellowship Initiative(2023VMB0008);the Shanghai Sailing Program(20YF1454800);the Natural Science Foundation of Shanghai(21ZR1472000);the Shanghai Strategic Emerging Industry Development Special Fund(31011442501217020191D3101001)。

摘　　要：The large-aperture pulse compression grating(PCG) is a critical component in generating an ultra-high-intensity, ultra-short-pulse laser;however, the size of the PCG manufactured by transmission holographic exposure is limited to large-scale high-quality materials. The reflective method is a potential way for solving the size limitation, but there is still no successful precedent due to the lack of scientific specifications and advanced processing technology of exposure mirrors. In this paper, an analytical model is developed to clarify the specifications of components, and advanced processing technology is adopted to control the spatial frequency errors. Hereafter, we have successfully fabricated a multilayer dielectric grating of 200 mm × 150 mm by using an off-axis reflective exposure system with Φ300 mm. This demonstration proves that PCGs can be manufactured by using the reflection holographic exposure method and shows the potential for manufacturing the meter-level gratings used in 100 petawatt class high-power lasers.

关 键 词：high-power laser off-axis reflective exposure system pulse compression grating spatial frequency errors SPECIFICATIONS 

分 类 号：TN248[电子电信—物理电子学]