氧化物光学薄膜的压入硬度研究  

Indent hardness of optical oxide films

作　　者：马孜[1] 李斌[1] 童静[1] 姚德武[1] 沈刚 MA Zi;LI Bin;TONG Jing;YAO Dewu;SHEN Gang(Southwest Institute of Technical Physics,Chengdu 610041,China)

机构地区：[1]西南技术物理研究所,成都610041

出　　处：《激光技术》2024年第3期340-344,共5页Laser Technology

摘　　要：为了评价离子源辅助对不同氧化物薄膜的影响,采用不同的镀膜设备沉积了TiO_(2)、Ta_(2)O_(5)、ZrO_(2)、SiO_(2)氧化物单层膜,用椭偏仪测量了其折射率和厚度,并用纳米压痕仪测量了不同载荷下材料的杨氏模量和纳米硬度,比较了不同离子源沉积条件下膜层这两个参数的变化。结果表明,离子源辅助能有效增加膜层杨氏模量和压入硬度,TiO_(2)增加了2 GPa,Ta_(2)O_(5)增加了4 GPa,ZrO_(2)增加了2 GPa,和膜层的折射率变化趋势是一致的。纳米压痕法也可作为评价离子源轰击能力的一种手段。To evaluate the effect of ion source assistance on different oxide films,TiO_(2),Ta_(2)O_(5),ZrO_(2)and SiO_(2)were deposited with different radio frequency(RF)sources.The index and thickness were measured by a spectroscopic ellipsometer.The Young’s module and the hardness of these films were compared.Experiments show that the value of Young’s module and hardness are increased,2 GPa for TiO_(2),4 GPa for Ta_(2)O_(5),2 GPa for ZrO_(2),in accordance with the film index.The nano-indention method is effective in evaluating the ability of ion sources.

关 键 词：薄膜 纳米压痕 压入硬度 氧化物 

分 类 号：O432[机械工程—光学工程]