Fabrication of Mie-resonant silicon nanoparticles using laser annealing for surface-enhanced fluorescence spectroscopy  

作　　者：Tatsuya Fukuta Ryo Kato Takuo Tanaka Taka-aki Yano 

机构地区：[1]Institute of Post-LED Photonics,Tokushima University,2-1 Minami-Josanjima,Tokushima,770-8506,Japan [2]Innovative Photon Manipulation Research Team,RIKEN Center for Advanced Photonics,Wako,Saitama,351-0198,Japan [3]Metamaterials Laboratory,RIKEN Cluster for Pioneering Research,Wako,Saitama,351-0109,Japan

出　　处：《Microsystems & Nanoengineering》2024年第2期133-141,共9页微系统与纳米工程（英文）

基　　金：supported in part by JST FOREST grant No.JPMJFR202I(T.Y.)and JST CREST grant No.JPMJCR1904(T.T.)from the Japan Science and Technology Agency,JST;Tateishi Science and Technology Foundation(R.K.).

摘　　要：Silicon nanostructures with unique Mie resonances have garnered considerable attention in the field of nanophotonics.Here,we present a simple and efficient method for the fabrication of silicon(Si)nanoparticle substrates using continuous-wave(CW)laser annealing.The resulting silicon nanoparticles exhibit Mie resonances in the visible region,and their resonant wavelengths can be precisely controlled.Notably,laser-annealed silicon nanoparticle substrates show a 60-fold enhancement in fluorescence.This tunable and fluorescence-enhancing silicon nanoparticle platform has tremendous potential for highly sensitive fluorescence sensing and biomedical imaging applications.

关 键 词：NANOPARTICLES ANNEALING RESONANT 

分 类 号：TB383[一般工业技术—材料科学与工程]