Study of bias voltage effect on the performance of ta-C coating prepared by high power impulse magnetron sputtering  

作　　者：冯利民 何哲秋 严森 李建中 石俊杰 Feng Limin;He Zheqiu;Yan Sen;Li Jianzhong;Shi Junjie(Key Laboratory for Ecological Metallurgy of Multimetallic Mineral(Ministry of Education),Northeastern University,Shenyang 110819,China;School of Metallurgy,Northeastern University,Shenyang 110819,China)

机构地区：[1]Key Laboratory for Ecological Metallurgy of Multimetallic Mineral(Ministry of Education),Northeastern University,Shenyang 110819,China [2]School of Metallurgy,Northeastern University,Shenyang 110819,China

出　　处：《China Welding》2024年第1期7-12,共6页中国焊接（英文版）

基　　金：supported by the National Key R&D Program of China(No.2019YFE0123900);the National Natural Sci-ence Foundation of China(Grant No.51974069);the Special Fund for Basic Scientific Research of Central Colleges(N2125035).

摘　　要：The mechanical and frictional properties of ta-C coatings deposited on the substrate surface affect applications in the field of cutting tools and wear-resistant components.In this paper,the effect of bias parameters on the performance of ta-C coatings was investigated based on high power impulse magnetron sputtering(HiPIMS)technology.The results show that bias voltage has a significant effect on the deposition rate,structure,and wear resistance of the coating.In the range of bias voltage−50 V to−200 V,the ta-C coating performance was the best under bias voltage−150 V.The thickness reached 530.4 nm,the hardness value reached 35.996 GPa,and the bonding force in-creased to 14.2 N.The maximum sp3 bond content was 59.53% at this condition.

关 键 词：bias voltage magnetron sputtering deposition rate wear resistance 

分 类 号：TG174.4[金属学及工艺—金属表面处理]