灯丝型辅助离子源的设计及其对薄膜参数的改善研究  

Design of filament-type auxiliary ion source and study on its improvement of thin film parameters

作　　者：任翼 张殷 周亚东 金尚忠 Ren Yi;Zhang Yin;Zhou Yadong;Jin Shangzhong(College of Optical and Electronic Technology,China Jiliang University,Hangzhou 310018,China;Suzhou Peaktra Technology Co.,Ltd,Suzhou 215151,China)

机构地区：[1]中国计量大学光学与电子科技学院,浙江杭州310018 [2]苏州岚创科技有限公司,江苏苏州215151

出　　处：《电镀与精饰》2024年第7期99-106,共8页Plating & Finishing

基　　金：国家科学自然基金项目-表面等离激元增强效应模型建立及验证研究(22204154)。

摘　　要：为了以较低成本的技术提高磁控溅射沉积薄膜的纯度、致密性和均匀性,设计出一种可以活化氧气的双腔室直流加热灯丝型辅助离子源。通过实验改变辅助离子源的工作参数,探究其对磁控溅射镀膜机所沉积薄膜的光学参数的影响。通过对比不同工艺条件下所沉积薄膜的透过率、折射率、基板上膜层不同位置的相对厚度,最终证明设计提出的辅助离子源可以一定程度改善Ta_(2)O_(5)和SiO_(2)单层镀膜的透过率、折射率以及均匀性,提升了原磁控溅射镀膜机的镀膜质量和有效镀膜面积,对提高镀膜生产效率具有一定指导意义。In order to improve the purity,compactness and uniformity of magnetron sputtering deposited films at a lower cost,a dual-chamber DC heating filament auxiliary ion source was designed which can activate oxygen.The working parameters of the auxiliary ion source were changed in the experiment to explore their influence on the optical parameters of the films deposited by magnetron sputtering coater.By comparing the transmittance,refractive index and relative thickness of the films which was deposited under different processing conditions,it is finally proved that the auxiliary ion source designed in this work can improve the transmittance,refractive index and uniformity of the single-layer films of Ta_(2)O_(5) and SiO_(2) which was coated in this experiment.Thus,the coating quality and effective coating area of the original magnetron sputtering coating machine are improved,and it does have certain practical significance for improving the efficiency of the coating.

关 键 词：离子源 结构设计 离子束辅助沉积(IBAD) 光学薄膜 

分 类 号：O484[理学—固体物理]