基于热模光刻的灰度曝光优化  

Optimization of Grayscale Exposure Based on Heat-Mode Lithography

作　　者：张文雅 Wenya Zhang(School of Optical-Electrical and Computer Engineering,University of Shanghai for Science and Technology,Shanghai)

机构地区：[1]上海理工大学光电信息与计算机工程学院,上海

出　　处：《建模与仿真》2024年第3期3009-3016,共8页Modeling and Simulation

摘　　要：相变材料以其卓越的光热稳定性和可擦写特性,展现出了极大的应用潜力。在相变过程中,这些材料的光学参数会发生变化。通过调整激光功率,我们能够实现对相变材料晶化状态的精准控制。膜系设计软件Macleod仿真也验证了这一特性。但由于材料自身的限制,可以得到的参数变化数量十分有限,在曝光时不能完全保留图片的灰度信息。因此提出利用模拟灰度曝光,只用一个激光功率实现多个灰度级的图片曝光。在GS薄膜上曝光了十七级灰度图片,并对其进行显影以增加灰度对比度。最后曝光了“罗小黑战记”图片,实现了该图片的高保真曝光。Phase change materials,with their excellent optical and thermal stability as well as erasable characteristics,have demonstrated tremendous application potential.During the phase transition process,the optical parameters of these materials undergo changes.By adjusting the laser power,we can achieve precise control of the crystallization state of phase change materials.This characteristic has also been verified through simulations using the film system design software Macleod.However,due to limitations inherent in the materials themselves,the number of parameter changes that can be achieved is quite limited,and it is not possible to fully retain the grayscale information of the image during exposure.Therefore,the idea of using simulated grayscale exposure has been proposed,which allows for the exposure of multiple grayscale levels of images using only one laser power.A seventeen-level grayscale image was exposed on a GS film,and it was developed to increase grayscale contrast.Finally,the image of“Luo Xiaohei Chronicles”was exposed,achieving a high-fidelity exposure of the image.

关 键 词：相变 灰度 光存储 折射率 

分 类 号：TP3[自动化与计算机技术—计算机科学与技术]