Effect of coil and chamber structure on plasma radial uniformity in radio frequency inductively coupled plasma  

作　　者：赵洋 周晓华 高升荣 宋莎莎 赵玉真 Yang ZHAO;Xiaohua ZHOU;Shengrong GAO;Shasha SONG;Yuzhen ZHAO(Shaanxi International Joint Research Center for Applied Technology of Controllable Neutron Source,Xijing University,Xi’an 710123,People’s Republic of China;Technological Institute of Materials&Energy Science(TIMES),Xi’an Key Laboratory of Advanced Photo-electronics Materials and Energy Conversion Device,School of Electronic Information,Xijing University,Xi’an 710123,People’s Republic of China)

机构地区：[1]Shaanxi International Joint Research Center for Applied Technology of Controllable Neutron Source,Xijing University,Xi’an 710123,People’s Republic of China [2]Technological Institute of Materials&Energy Science(TIMES),Xi’an Key Laboratory of Advanced Photo-electronics Materials and Energy Conversion Device,School of Electronic Information,Xijing University,Xi’an 710123,People’s Republic of China

出　　处：《Plasma Science and Technology》2024年第7期58-66,共9页等离子体科学和技术（英文版）

基　　金：supported by the Scientific Research Foundation of Xijing University,China(No.XJ19T03);the Opening Project of Science and Technology on Reliability Physics and Application Technology of Electronic Component Laboratory(No.ZHD201701);the Natural Science Basic Research Plan in Shaanxi Province of China(No.2024JC-YBMS-342).

摘　　要：Enhancing plasma uniformity can be achieved by modifying coil and chamber structures in radio frequency inductively coupled plasma(ICP)to meet the demand for large-area and uniformly distributed plasma in industrial manufacturing.This study utilized a two-dimensional self-consistent fluid model to investigate how different coil configurations and chamber aspect ratios affect the radial uniformity of plasma in radio frequency ICP.The findings indicate that optimizing the radial spacing of the coil enhances plasma uniformity but with a reduction in electron density.Furthermore,optimizing the coil within the ICP reactor,using the interior point method in the Interior Point Optimizer significantly enhances plasma uniformity,elevating it from 56%to 96%within the range of the model sizes.Additionally,when the chamber aspect ratio k changes from 2.8 to 4.7,the plasma distribution changes from a center-high to a saddleshaped distribution.Moreover,the plasma uniformity becomes worse.Finally,adjusting process parameters,such as increasing source power and gas pressure,can enhance plasma uniformity.These findings contribute to optimizing the etching process by improving plasma radial uniformity.

关 键 词：inductively coupled plasma fluid simulation optimized coil chamber aspect ratio plasma uniformity 

分 类 号：Z89[文化科学]