Metasurface array for single-shot spectroscopic ellipsometry  

作　　者：Shun Wen Xinyuan Xue Shuai Wang Yibo Ni Liqun Sun Yuanmu Yang 

机构地区：[1]Department of Precision Instrument,State Key Laboratory of Precision Measurement Technology and Instruments,Tsinghua University,Beijing 100084,China

出　　处：《Light(Science & Applications)》2024年第5期835-842,共8页光（科学与应用)（英文版）

基　　金：the National Natural Science Foundation of China(62135008,61975251);the Guoqiang Institute,Tsinghua University。

摘　　要：Spectroscopic ellipsometry is a potent method that is widely adopted for the measurement of thin film thickness and refractive index.Most conventional ellipsometers utilize mechanically rotating polarizers and grating-based spectrometers for spectropolarimetric detection.Here,we demonstrated a compact metasurface array-based spectroscopic ellipsometry system that allows single-shot spectropolarimetric detection and accurate determination of thin film properties without any mechanical movement.The silicon-based metasurface array with a highly anisotropic and diverse spectral response is combined with iterative optimization to reconstruct the full Stokes polarization spectrum of the light reflected by the thin film with high fidelity.Subsequently,the film thickness and refractive index can be determined by fitting the measurement results to a proper material model with high accuracy.Our approach opens up a new pathway towards a compact and robust spectroscopic ellipsometry system for the high throughput measurement of thin film properties.

关 键 词：properties. SPECTROSCOPIC FILM 

分 类 号：O43[机械工程—光学工程]