Advanced manufacturing of dielectric metadevices  

作　　者：Wenhong Yang Junxiao Zhou Din Ping Tsai Shumin Xiao 

机构地区：[1]Key Lab of Micro-Nano Optoelectronic Information System,Ministry of Industry and Information Technology,Guangdong Provincial Key Laboratory of Semiconductor Optoelectronic Materials and Intelligent Photonic Systems,Harbin Institute of Technology,Shenzhen,China [2]Department of Electrical Engineering,City University of Hong Kong,Hong Kong,China [3]The State Key Laboratory of Terahertz and Millimeter Waves,City University of Hong Kong,Hong Kong,China [4]Centre for Biosystems,Neuroscience,and Nanotechnology,City University of Hong Kong,Hong Kong,China [5]Pengcheng Laboratory,Shenzhen,China

出　　处：《Photonics Insights》2024年第2期31-70,共40页光子学评论（英文）

基　　金：supported by the National Key Research and Development Project of China (Nos.2022YFA1404700,2023YFB2806700,and 2021YFA1400802);National Natural Science Foundation of China (Nos.6233000076,12334016,12025402,62125501,11934012,12261131500,92250302,and 62375232);Shenzhen Fundamental Research Project (Nos.JCYJ20210324120402006,JCYJ20220818102218040,and GXWD20220817145518001);University Grants Committee/Research Grants Council of the Hong Kong Special Administrative Region,China (Project No.AoE/P-502/20,CRF Project Nos.C5031-22G and C1015-21E,GRF Project Nos.CityU15303521 and CityU11305223;and Germany/Hong Kong Joint Research Scheme:GCityU101/22);Project of City University of Hong Kong (Nos.9380131,9610628,and 7005867).

摘　　要：Metasurfaces,composed of two-dimensional nanostructures,exhibit remarkable capabilities in shaping wavefronts,encompassing phase,amplitude,and polarization.This unique proficiency heralds a transformative paradigm shift in the domain of next-generation optics and photonics,culminating in the development of flat and ultrathin optical devices.Particularly noteworthy is the all-dielectric-based metasurface,leveraging materials such as titanium dioxide,silicon,gallium arsenide,and silicon nitride,which finds extensive application in the design and implementation of high-performance optical devices,owing to its notable advantages,including a high refractive index,low ohmic loss,and cost-effectiveness.Furthermore,the remarkable growth in nanofabrication technologies allows for the exploration of new methods in metasurface fabrication,especially through wafer-scale nanofabrication technologies,thereby facilitating the realization of commercial applications for metasurfaces.This review provides a comprehensive overview of the latest advancements in state-of-the-art fabrication technologies in dielectric metasurface areas.These technologies,including standard nanolithography[e.g.,electron beam lithography(EBL)and focused ion beam(FIB)lithography],advanced nanolithography(e.g.,grayscale and scanning probe lithography),and large-scale nanolithography[e.g.,nanoimprint and deep ultraviolet(DUV)lithography],are utilized to fabricate highresolution,high-aspect-ratio,flexible,multilayer,slanted,and wafer-scale all-dielectric metasurfaces with intricate nanostructures.Ultimately,we conclude with a perspective on current cutting-edge nanofabrication technologies.

关 键 词：DIELECTRIC meta-devices meta-optics metasurface nanofabrication NANOTECHNOLOGY NANOPHOTONICS large/waferscale nanofabrication 

分 类 号：TN30[电子电信—物理电子学]