铜缓蚀剂及其与硅烷复合自组装膜耐腐蚀性能  

Copper Corrosion Inhibitor and Its Corrosion Resistance of Self-assembled Film with Silane Composite

作　　者：郭叙言 庄普誉 吴尚澄 王桂香 王志登 GUO Xuyan;ZHUANG Puyu;WU Shangcheng;WANG Guixiang;WANG Zhideng(Yantai Research Institute of Harbin Engineering University,Shandong Yantai 264006,China;AECC Shenyang Liming Aero-engine Co.,Ltd.,Shenyang 110043,China)

机构地区：[1]烟台哈尔滨工程大学研究院,山东烟台264006 [2]中国航发沈阳黎明航空发动机有限责任公司,沈阳110043

出　　处：《表面技术》2024年第14期106-115,共10页Surface Technology

基　　金：烟台市科技创新发展计划基础研究类项目(2022JCYJ023);国家自然科学基金(51971071)。

摘　　要：目的解决铜及铜合金在海水介质中的腐蚀问题。方法采用自组装技术在铜表面制备了甲基-1H-苯并三唑(TTA)、十六烷基三甲基溴化铵(CTAB)、L-精氨酸和L-组氨酸4种缓蚀剂的自组装膜,并将这4种缓蚀剂分别与双-[γ-(三乙氧基硅)丙基]四硫化物(Si-69)进行组合制备了复合自组装膜,通过电化学方法研究了铜表面自组装膜的耐腐蚀性能。结果所有缓蚀剂及其复合膜层均具有一定的耐腐蚀性,不同缓蚀剂自组装膜的缓蚀效率从大到小为:CTAB(78.78%)>TTA(61.00%)>组氨酸(56.03%)>精氨酸(46.38%)。相比空白铜样品的水接触角(76.9°),CTAB自组装膜的接触角达100.7°。缓蚀剂与Si-69复配的自组装膜性能比单一缓蚀剂或硅烷更加优异,且在4种缓蚀剂中CTAB效果最好,其缓蚀效率达96.91%,其余依次为TTA(85.38%)、组氨酸(84.91%)和精氨酸(82.09%)。CTAB与硅烷复合膜层的水接触角为105.6°。结论在铜表面制备CTAB、TTA、组氨酸、精氨酸4种自组装膜可以有效提高材料的耐蚀性。将4种缓蚀剂与硅烷复配时缓蚀效率均有提高,硅烷的加入能够改善缓蚀剂自组装膜层结构,提高耐蚀性。结果表明,利用缓蚀剂与硅烷复配的协同效应来提高膜层性能是一种可行的思路。People have discovered a series of organic self-assembled substances that can provide good corrosion resistance to the copper matrix,but individual corrosion inhibitors often only have limited functional groups that react with the copper surface.In response to this issue,this article considers the composite effect of multiple organic film-forming agents to reduce the limitations of using a single corrosion inhibitor to a certain extent,and to modify the surface of copper materials in marine environments to improve the range of use of copper materials under harsh corrosion conditions.Copper and copper alloys often suffer from severe corrosion in marine environments.In order to solve the corrosion of copper and copper alloys in seawater,self-assembled monolayers of methyl-1h-benzotriazole(TTA),cetyltrimethylammonium bromide(CTAB),L-arginine and L-histidine were formed on the copper surface by self-assembly technology.The four inhibitors were mixed with BIS-[γ-(Triethoxysilicon)propyl]tetrasulfide(Si-69)to prepare composite self-assembled monolayers.Electrochemical methods were used to study the corrosion resistance of self-assembled monolayers on copper surfaces.The morphology and element distribution of the prepared copper surface self-assembled film were characterized by scanning electron microscopy and X-ray energy spectrum,and the hydrophobicity of the film was characterized through water contact angle testing.The results showed that all the inhibitors and their composite coatings had good corrosion resistance.The order of corrosion resistance(inhibition efficiency)between different inhibitor self-assembled films was CTAB(78.78%)>TTA(61.00%)>histidine(56.03%)>arginine(46.38%).The performance of self-assembled monolayers composed of corrosion inhibitor and Si-69 was better than that of single corrosion inhibitor or silane,and CTAB had the best effect among the four corrosion inhibitors,with the inhibition efficiency of 96.91%,and the rest were TTA(85.38%),histidine(84.91%)and arginine(82.09%)in turn.Compared wi

关 键 词：自组装 铜 硅烷偶联剂 缓蚀剂 耐蚀性 协同效应 

分 类 号：TG174[金属学及工艺—金属表面处理]