微米级SiO_(2)中空微球的制备及自组装光子晶体的红外性能  

Preparation of Micrometer sized SiO_(2)Hollow Microspheres and Infrared Properties of Self-Assembled Photonic Crystals

作　　者：吴文强 李帅 陈仕乐 郎莹 汪长安 WU Wenqiang;LI Shuai;CHEN Shile;LANG Ying;WANG Chang′an(School of Materials Science and Engineering,Jingdezhen Ceramic Institute,Jingdezhen 333403,Jiangxi,China;State Key Laboratory of New Ceramics and Fine Processing,School of Materials Science and Engineering,Tsinghua University,Beijing 100084,China)

机构地区：[1]景德镇陶瓷大学,材料科学与工程学院,江西景德镇333403 [2]清华大学材料学院,新型陶瓷与精细工艺国家重点实验室,北京100084

出　　处：《硅酸盐学报》2024年第6期1996-2002,共7页Journal of The Chinese Ceramic Society

基　　金：国家自然科学基金资助项目(编号52173257和52372064)。

摘　　要：以聚苯乙烯(PS)为模板、十六烷基三甲基溴化铵(CTAB)为表面改性剂、正硅酸四乙酯(TEOS)为硅源,采用硬模板包裹法结合乙酸乙酯浸蚀的工艺,制备了微米级SiO_(2)中空微球,并进行垂直沉积自组装成微米级SiO_(2)中空微球光子晶体,研究了TEOS含量、浸蚀条件对中空微球形貌的影响,以及垂直沉积自组装溶液浓度对微米级SiO_(2)中空微球光子晶体红外性能的影响。结果表明:随着TEOS含量的增加,SiO_(2)包覆层表面由疏松变得致密,进一步增加会生成次生SiO_(2)颗粒,导致均匀性变差;在60℃乙酸乙酯中浸蚀10 min时,微米级SiO_(2)中空微球分散性好、球形度高,直径达到1570 nm、壁厚达到65 nm;随着自组装溶液质量浓度的增大,微米级SiO_(2)中空微球的排列变得整齐、层数增多,红外反射率升高,在溶液质量浓度为0.005 g/m L时反射率最高为85%。微米级SiO_(2)中空微球光子晶体除实现红外辐射调控之外,还具有隔热性能好、比重小等优点,在航空航天飞行器的红外隐身涂层、建筑保温等领域具有重要的应用前景。Introduction Micron-sized SiO_(2)hollow microspheres were prepared by a hard template encapsulation method and an ethyl acetate etching process with polystyrene(PS)as a template,hexadecyltrimethylammonium bromide(CTAB)as a surface modifier,and tetraethyl orthosilicate(TEOS)as a silicon source,and vertically deposited self-assembled into micron-sized SiO_(2)hollow microsphere photonic crystals.The effects of TEOS content and etching conditions on the morphology of hollow microspheres,as well as the effect of vertical deposition self-assembly solution concentration on the infrared properties of micrometer sized SiO_(2)hollow microsphere photonic crystals were investigated.Methods For the preparation of micron-sized PS@SiO_(2)microspheres,0.15 g of polystyrene microspheres with the size of 1.5μm were dissolved in 160 mL of deionized water and 80 mL of anhydrous ethanol.After ultrasonic dispersion,0.03 g of CTAB was added to modify the surface of the polystyrene template under stirring.After 30 min,3 mL of 25%ammonia water was added to prepare solution A.0.2 mL of ethyl orthosilicate was dissolved in 5 mL of anhydrous ethanol to prepare solution B.Solution B was mixed with solution A under stirring at room temperature for 24 h.The reacted solution was filtered and washed with anhydrous ethanol and deionized water for three times.PS@SiO_(2)material was obtained after drying.For the preparation of micron-sized SiO_(2)hollow microspheres,0.5 g of PS@SiO_(2)microspheres were dispersed in 20 mL of ethyl acetate,and heated at 60℃for 10 min after ultrasonic dispersion.The PS template was etched off by ethyl acetate.Subsequently,the slurry was filtered and washeda with anhydrous ethanol and deionized water for three times to obtain micron-sized SiO_(2)hollow microspheres.For the preparation of micron-sized SiO_(2)hollow microsphere photonic crystals,a microsphere suspension was dispersed for a certain time,and then a cleaned hydrophilic glass substrate was vertically immersed into the microsphere suspension,and dried at 6

关 键 词：乙酸乙酯 微米级二氧化硅中空微球 光子晶体 红外发射率 

分 类 号：TB383[一般工业技术—材料科学与工程]