偏压对HiPIMS制备TiAlSiN涂层结构与性能的影响  

Influence of Bias Voltage on Microstructure and Properties of TiAlSiN Coatings Prepared by HiPIMS

作　　者：杜建融 陶冠羽 陈辉 易娟 万洪 刘书洋 张钰 DU Jianrong;TAO Guanyu;CHEN Hui;YI Juan;WAN Hong;LIU Shuyang;ZHANG Yu(China Academy of Machinery Wuhan Research Institute of Materials Protection Co.,Ltd.,Wuhan 430030,China;State Key Laboratory of Special Surface Protection Materials and Application Technology,Wuhan 430030,China;School of Automotive Engineering,Wuhan University of Technology,Wuhan 430070,China;Wuhan Redsun Chemical Co.,Ltd.,Huanggang 438000,China)

机构地区：[1]中国机械总院集团武汉材料保护研究所有限公司,湖北武汉430030 [2]特种表面保护材料及应用技术国家重点实验室,湖北武汉430030 [3]武汉理工大学汽车工程学院,湖北武汉430070 [4]武汉瑞阳化工有限公司,湖北黄冈438000

出　　处：《材料保护》2024年第7期30-42,共13页Materials Protection

基　　金：装备制造基础通用国际标准研究(2021YFF0601702);湖北省重点研发计划项目(2021BAA210);国家自然科学基金面上基金项目(52175182);湖北省自然科学基金计划项目(2022CFB936)。

摘　　要：为了探究偏压对高功率脉冲磁控溅射(HiPIMS)制备TiAlSiN涂层的成分结构、力学性能与摩擦学性能的影响与机制,利用HiPIMS技术,通过调控基体偏压(0~-200 V)在YG8硬质合金与N型单晶(111)Si上沉积TiAlSiN涂层。采用扫描电子显微镜(SEM)、X射线衍射仪(XRD)、电子探针(EPMA)、X射线光电子能谱仪(XPS)、超景深显微镜、白光干涉仪、纳米压痕仪、划痕仪、往复式摩擦磨损试验机对TiAlSiN涂层进行微观结构、组成表征与性能测试。结果表明:HiPIMS放电行为方面,偏压的升高会使HiPIMS起辉电压提高,但对平台阶段放电电压与放电电流影响并不明显;在不同偏压条件下所制备的TiAlSiN涂层中元素组成相对含量变化较小;随着偏压的升高TiAlSiN涂层由hcp-(Ti,Al)N+fcc-(Ti,Al)N转变为fcc-(Ti,Al)N;随着偏压的升高会使涂层截面结构从疏松的柱状晶结构转变为无明显缺陷的致密堆积结构,表面结节状缺陷消失,且晶粒尺寸逐渐降低;力学性能方面,随着偏压的升高,TiAlSiN涂层的硬度与结合力均呈现上升趋势,涂层在-200 V时达到最佳性能,其中硬度达到最大的26.19 GPa,H/E^(*)达到最大的0.0995,结合力在达到最大的19.63 N时,涂层磨损率最小,为9×10^(-15)m^(3)/(N·m)。综上可知,利用HiPIMS技术,通过改变基体偏压能实现涂层微观结构与性能的调控,提高涂层韧性的同时,还能显著提升涂层的结合力与摩擦学性能。For investigating the influence and mechanism of bias voltage on the composition structure,mechanical properties and tribological properties of TiAlSiN coatings prepared by high-power pulsed magnetron sputtering(HiPIMS),TiAlSiN coatings were deposited on YG8 hardness alloy and N-type single crystal(111)Si by HiPIMS technology with regulating substrate bias voltage(0~-200 V).The microstruc-ture,composition characterization and performance testing of TiAlSiN coatings were carried out by scanning electron microscopy(SEM),X-ray diffraction(XRD),electron probe microscopy(EPMA),X-ray photoelectron spectroscopy(XPS),ultra depth of field microscopy,white light interferometry,nanoindentation,scratch and reciprocating friction and wear testing machines.Results showed that in terms of HiPIMS discharge behavior,an increase in bias voltage could increase the HiPIMS ignition voltage,but the impact on the discharge voltage and current during the platform stage was not significant.The relative changes in elemental composition of TiAlSiN coatings prepared under different bias conditions were relatively small.As the bias voltage increased,the TiAlSiN coating changed from hcp-(Ti,Al)N+fcc-(Ti,Al)N to fcc-(Ti,Al)N.In addition,as the bias voltage increased,the cross-sectional structure of the coating transformed from a loose columnar crys-tal structure to a dense stacked structure without obvious defects,with surface nodular defects disappearing and grain size gradually decreasing.In terms of mechanical properties,with the increase of bias voltage,the hardness and adhesion of TiAlSiN coating exhibited an upward trend.The coating prepared at-200 V achieved optimal performance,with a maximum hardness of 26.19 GPa and a maximum H/E∗of 0.0995.When the bonding force reached a maximum of 19.63 N,the coating had the lowest wear rate,which was 9×10^(-15)μm^(3)/(Nm).Based on the above analysis,the microstructure and properties of the coating could be controlled by changing the substrate bias voltage during HiPIMS process,which also improv

关 键 词：TiAlSiN涂层 高功率脉冲磁控溅射 基体偏压 微观结构 力学性能 

分 类 号：TG174.4[金属学及工艺—金属表面处理]