磁控溅射镀膜技术在(Cr,Ti,Al)N涂层上的应用  

Application of Magnetron Sputtering Deposition Technology for(Cr,Ti,Al)N Coatings

作　　者：赵凡 项燕雄 邹长伟 于云江 梁枫 ZHAO Fan;XIANG Yan-xiong;ZOU Chang-wei;YU Yun-jiang;LIANG Feng(School of Physics Science and Technology,Lingnan Normal University,Zhanjiang 524048,China)

机构地区：[1]岭南师范学院物理科学与技术学院,广东湛江524048

出　　处：《真空》2024年第4期22-29,共8页Vacuum

基　　金：广东省高校创新团队基金项目(2020KCXTD032);广东省自然科学基金项目(2021A1515011928,2022A1515011137)。

摘　　要：过渡金属氮化物硬质涂层在切削刀具、精密模具和机械零部件等领域有着广泛的应用。随着切削技术的进步和难加工材料的增多,硬质涂层已由传统的二元涂层向着三元、四元涂层不断发展。(Cr,Ti,Al)N四元涂层因其优异的综合性能而备受研究人员的关注。本文从磁控溅射镀膜的基本原理和技术特点出发,介绍了制备(Cr,Ti,Al)N涂层常见的磁控溅射镀膜技术,分析了采用单质靶与合金靶沉积镀膜的效果及其各自的优缺点,研究了磁控溅射工艺参数对(Cr,Ti,Al)N涂层机械性能的影响,最后讨论了(Cr,Ti,Al)N梯度涂层的作用及其制备方法。本文可为设计(Cr,Ti,Al)N涂层制备工艺、改善(Cr,Ti,Al)N涂层性能提供理论参考与指导。Transition metal nitride hard coatings are widely used for cutting tools,precision molds and mechanical parts.With the development of cutting technology and the increase of difficult-to-process materials,hard coatings have been continuously developed from traditional binary coatings to ternary coatings and quaternary coatings.The(Cr,Ti,Al)N quaternary coatings have attracted much attention because of their excellent comprehensive properties.Based on the basic principle and technical characteristics of magnetron sputtering deposition,this paper introduces the common magnetron sputtering deposition technology for the preparation of(Cr,Ti,Al)N coating,analyzes the effect of using elemental target and alloy target for deposition,and studies the influence of magnetron sputtering process parameters on the mechanical properties of(Cr,Ti,Al)N coating,and finally discusses the function and preparation method of(Cr,Ti,Al)N gradient coating.This paper may provide theoretical reference and guidance for designing the preparation process and improving the properties of(Cr,Ti,Al)N coating.

关 键 词：(Cr Ti Al)N涂层 磁控溅射 靶材选择 工艺参数 梯度涂层 

分 类 号：TB43[一般工业技术] TG174.444[金属学及工艺—金属表面处理]