基于多孔硅支架的钛锆钒非蒸散型吸气剂薄膜的制备及表征  

Preparation and Characterization of Titanium-Zirconium-Vanadium Non-Evaporable Getter Film Based on Porous Silicon Scaffold

作　　者：李宇龙 李伟[1] 王贤艺 曹青 LI Yulong;LI Wei;WANG Xianyi;CAO Qing(School of Mechanical Engineering,Hefei University of Technology,Hefei 230009,China)

机构地区：[1]合肥工业大学机械工程学院,合肥230009

出　　处：《真空科学与技术学报》2024年第7期570-576,共7页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金青年基金项目(62101172);中国博士后科学基金项目(2023M743110)。

摘　　要：非蒸散型吸气剂薄膜近年以来在真空领域受到广泛的研究与应用,但有限的吸气速率和吸气容量阻碍了其进一步的发展。文章使用双槽电化学腐蚀法制备了多孔硅支架,再经过直流磁控溅射沉积了非蒸散型钛锆钒吸气剂薄膜,获得三维结构薄膜吸气剂。通过高分辨场发射扫描电子显微镜、热重分析、真空吸氢测试分别对薄膜的形貌和吸气性能进行了研究。吸氢性能测试结果表明,沉积在硅片与多孔硅支架上的400 nm厚度的薄膜,最大吸气速率分别为0.035 L·s^(-1)·cm^(2)和0.100 L·s^(-1)·cm^(-2),提升了185.71%;吸气容量分别为0.143 Pa·L·cm^(-2)和0.353 Pa·L·cm^(-2),提升了146.85%。将薄膜沉积在多孔硅支架上,提高了吸气剂的比表面积和孔隙率,增大了气体分子与吸气剂表面的接触面积,促进了吸气剂对气体分子的表面吸附和扩散作用,有效的增强了非蒸散型吸气剂薄膜的吸气性能。The non-evaporable getter film has been extensively researched and applied in the field of vacuum technology in recent years.However,its further development is hindered by limited adsorption rate and capacity.In this study,a porous silicon scaffold was prepared using the double-tank electrochemical corrosion method,followed by the deposition of non-evaporable titanium-zirconium-vanadium(Ti-Zr-V)getter film through DC magnetron sputtering to obtain three-dimensional(3D)film getter.The morphology and gas adsorption performance of the film getter were investigated using high-resolution field emission scanning electron microscopy,thermogravimetric analyzer,and hydrogen adsorption test,respectively.The results of the hydrogen adsorption performance test revealed that films with a thickness of 400 nm deposited on both silicon wafer and porous silicon exhibited maximum adsorption rates of 0.035 L·s^(-1)·cm^(-2) and 0.100 L·s^(-1)·cm^(-2),representing an increase of 185.71%.Furthermore,their respective adsorption capacities were measured as 0.143 Pa·L·cm^(-2) and 0.353 Pa·L·cm^(-2) which increased by 146.85%.Depositing the film on a porous silicon scaffold enhanced the specific surface area and porosity of the film getter,thereby increasing contact between gas molecules and the getter surface,leading to improved gas molecule adsorption and diffusion processes within it,thus effectively enhancing its overall adsorption performance.

关 键 词：非蒸散型吸气剂薄膜 多孔硅支架 钛锆钒 吸气性能 

分 类 号：TB741[一般工业技术—材料科学与工程]