Three-dimensional crystal defect imaging by STEM depth sectioning  

作　　者：Ryo Ishikawa Naoya Shibata Yuichi Ikuhara 

机构地区：[1]Institute of Engineering Innovation,The University of Tokyo,Bunkyo,Tokyo 113-8656,Japan

出　　处：《Chinese Physics B》2024年第8期2-7,共6页中国物理B（英文版）

基　　金：Project supported by JST-PRESTO (Grant No.JPMJPR1871);JST-FOREST (Grant No.JPMJFR2033);JST-ERATO (Grant No.JPMJER2202);KAKENHI JSPS (Grant Nos.JP19H05788,JP21H01614,and JP24H00373);“Next Generation Electron Microscopy”social cooperation program at the University of Tokyo。

摘　　要：One of the major innovations awaiting in electron microscopy is full three-dimensional imaging at atomic resolution.Despite the success of aberration correction to deep sub-angstrom lateral resolution,spatial resolution in depth is still far from atomic resolution.In scanning transmission electron microscopy(STEM),this poor depth resolution is due to the limitation of the illumination angle.To overcome this physical limitation,it is essential to implement a next-generation aberration corrector in STEM that can significantly improve the depth resolution.This review discusses the capability of depth sectioning for three-dimensional imaging combined with large-angle illumination STEM.Furthermore,the statistical analysis approach remarkably improves the depth resolution,making it possible to achieve three-dimensional atomic resolution imaging at oxide surfaces.We will also discuss the future prospects of three-dimensional imaging at atomic resolution by STEM depth sectioning.

关 键 词：atomic-resolution STEM STEM depth sectioning depth resolution DOPANTS surface topography 

分 类 号：TN16[电子电信—物理电子学] TP391.41[自动化与计算机技术—计算机应用技术]