镀铬层表面微坑阵列PDMS掩膜电解加工研究  

Research on Electrochemical Micromachining of Micro-dimple Array with a PDMS Mask on Chromium Plating Surface

作　　者：刘金玲 张庆良[1,2] 张磊 曲宁松[1] LIU Jinling;ZHANG Qingliang;ZHANG Lei;QU Ningsong(College of Mechanical and Electrical Engineering,Nanjing University of Aeronautics and Astronautics,Nanjing 210016,China;AVIC Nanjing Engineering Institute of Aircraft Systems,Nanjing 211016,China)

机构地区：[1]南京航空航天大学机电学院,江苏南京210016 [2]中国航空工业集团公司金城南京机电液压工程研究中心,江苏南京210016

出　　处：《电加工与模具》2024年第4期33-39,共7页Electromachining & Mould

基　　金：国家自然科学基金创新群体项目(51921003)。

摘　　要：以聚二甲基硅氧烷(PDMS)为掩膜的微细电解加工能高效地加工出群微坑阵列,从而改善表面摩擦学性能,提高零件使用寿命,但因电场边缘效应,得到的微坑阵列尺寸均匀性较差。针对这一现象,采用厚层PDMS模板并利用高压静液进行掩膜电解加工,探究工艺参数对铬层表面的微坑阵列尺寸与加工精度的影响,并在耐磨的镀铬层表面进行加工以进一步验证铬层表面摩擦学性能,分析微坑尺寸对镀铬层表面摩擦性能的影响。结果表明,在占空比100%、直流电压30 V、加工时间30 s时,可加工出平均直径和深度分别为106.23μm和15.33μm的微坑阵列,在此基础上探究加工的减磨效果,发现不同直径的微坑阵列均在5μm的深度时达到最佳减磨效果。Microelectrochemical machining using polydimethylsiloxane(PDMS)as a mask can efficiently achieves a group of micro-dimple array,thereby improving surface tribological properties and prolonging the lifespan of components.However,the size uniformity of the obtained micro-dimple arrays is poor due to the edge effect of the electric field.To address this issue,a thick PDMS film plate and high pressure hydrostatic was used for mask electrochemical machining to explore the influence of process parameters on the size and machining accuracy of micro-dimple array on the surface of the chromium coating layer.Then processing was carried out on the wear-resistant chromium plating layer surface to verify the friction performance of the chromium coating layer surface,and the influence of micro-dimple array size on the friction performance of the chromium plating layer surface was analyzed.The result showed micro-dimple arrays with average diameter and depth of 106.23μm and 15.33μm can be processed under a duty cycle of 100%,a voltage of 30 V and a processing time of 30 s.On this basis,the anti-wear effect of machining was explored,and it was found that micro-dimple arrays with different diameters achieved the best anti-wear effect at a depth of 5μm.

关 键 词：掩膜电解加工 镀铬层 微坑阵列 

分 类 号：TG662[金属学及工艺—金属切削加工及机床]