激光直写光刻技术的发展与应用(特邀)  

Development and Application of Laser Direct Writing Lithography Technology(Invited)

作　　者：陈林森 黄文彬[1,2] 浦东林 乔文 周冯斌 眭博闻 孟志 Chen Linsen;Huang Wenbin;Pu Donglin;Qiao Wen;Zhou Fengbin;Sui Bowen;Meng Zhi(College of Optoelectronic Science and Engineering,Soochow University,Suzhou 215006,Jiangsu,China;Engineering Research Center of Digital Laser Imaging and Display,Ministry of Education,Suzhou 215006,Jiangsu,China)

机构地区：[1]苏州大学光电科学与工程学院,江苏苏州215006 [2]数码激光成像与显示教育部工程研究中心,江苏苏州215006

出　　处：《中国激光》2024年第12期278-291,共14页Chinese Journal of Lasers

基　　金：国家重点研发计划(2022YFB3606603);国家自然科学基金面上项目(61975140,62075145);江苏省前沿引领技术基础研究专项(BK20192003);苏州市重点产业创新前瞻性应用研究项目(SYG201930);江苏高校优势学科建设工程(PAPD)。

摘　　要：以“光”为媒介的激光直写技术是研制先进功能材料与功能元器件的重要途径、探索未知光电子世界的窗口,也是通向更高制造目标的桥梁。激光直写产生的微纳结构形貌及其排列所形成的许多新特性、新现象和新机理是研究制备新材料、新器件的重要途径,牵引着光电子器件与材料研究和应用的发展,在柔性触控传感、微波天线、薄膜成像器件、3D显示面板、虚实融合光波导镜片等新型信息领域具有巨大的应用价值,引领着激光直写光刻技术向大面积、3D形貌、多维调控方向发展。本文综述了激光直写光刻技术在制备新型微纳结构方面面临的重大挑战以及激光直写光刻技术创新和装备成果,同时展示了该技术在新型显示、大尺寸触控、光场调控等领域的应用。Significance The significance of laser direct writing lithography technology lies in its unique ability to harness the power of light as a medium for fabricating advanced functional materials and devices.This technology not only offers a gateway to explore the unknown realm of optoelectronics but also serves as a bridge to achieve higher manufacturing goals.The micro-nano structures and arrangements created via laser direct writing exhibit novel characteristics,phenomena,and mechanisms,providing crucial insights into the development of new materials and devices.As such,laser direct writing holds immense potential in driving the advancement and application of innovative optoelectronic devices and materials.In the current technological revolution,the demand for high-performance,miniaturized,and multifunctional devices is constantly increasing.Laser direct writing lithography technology meets these demands by enabling the precise and controllable fabrication of micro-nano structures with complex geometries and compositions.This technology has the potential to revolutionize various fields,including flexible touch sensors,microwave antennas,thin-film imaging devices,3D display panels,and virtual-real fusion optics.Therefore,the significance of laser direct writing lithography technology lies not only in its scientific and technological advancements but also in its potential to transform various industries and societal applications.Progress Significant progress has been made in the field of laser direct writing lithography technology in recent years.Researchers have developed innovative methods and techniques to enhance the precision,resolution,and speed of fabrication processes.One of the key advancements is the development of high-powered lasers with optimized beam profiles,as these lasers enable the creation of complex micro-nano structures with improved accuracy and reproducibility.Moreover,advancements in materials science have led to the development of novel materials that are compatible with laser direct writing

关 键 词：激光直写光刻技术 微纳光学 3D形貌 新型显示 

分 类 号：TN29[电子电信—物理电子学]