Ronchi剪切干涉仪高精度相位提取及误差分析  

High-Precision Phase Extraction and Error Analysis of Ronchi Lateral Shearing Interferometry

作　　者：常春超 李中梁[1,2] 卢云君 王向朝[1,3,4] Chang Chunchao;Li Zhongliang;Lu Yunjun;Wang Xiangzhao(Laboratory of Information Optics and Opto-Electronic Technology,Shanghai Institute of Optics and Fine Mechanics,Chinese Academy of Sciences,Shanghai 201800,China;Center of Materials Science and Optoelectronics Engineering,University of Chinese Academy of Sciences,Beijing 100049,China;College of Optical Science and Engineering,Zhejiang University,Hangzhou 310027,Zhejiang,China;State Key Laboratory of Extreme Photonics and Instrumentation,Zhejiang University,Hangzhou 310058,Zhejiang,China)

机构地区：[1]中国科学院上海光学精密机械研究所信息光学与光电技术实验室,上海201800 [2]中国科学院大学材料与光电研究中心,北京100049 [3]浙江大学光电科学与工程学院,浙江杭州310027 [4]浙江大学极端光学技术与仪器全国重点实验室,浙江杭州310058

出　　处：《中国激光》2024年第11期537-549,共13页Chinese Journal of Lasers

基　　金：中国科学院青年创新促进会项目;中国科学院战略性先导科技专项(XDA0380000)。

摘　　要：双光栅Ronchi剪切干涉是一种基于瞳面测量的波像差检测技术,该技术具有无需参考面、共光路测量以及结构简单、易于集成等优点,适用于光刻投影物镜波像差的在线检测。相位提取是采用该技术进行波像差检测的重要步骤,直接影响最终的测量精度。针对双光栅Ronchi剪切干涉仪高阶衍射光影响相位提取精度的问题,提出了一种高精度的相位提取算法,可消除剪切干涉场中±1级衍射光重叠区域内高阶衍射光的干扰,提高剪切相位提取精度。仿真结果表明,该算法的剪切相位提取误差仅存在高频拟合残差,验证了该算法可有效抑制高阶衍射光的干扰。利用剪切率为0.058的双光栅Ronchi剪切干涉系统进行了实验,并与基于双光纤的点衍射干涉仪的测量结果进行对比,两种方法的测量结果具有相同的波像差分布,验证了所提剪切相位提取算法的有效性。Objective Lithographic technology is one of the core technologies for large scale integrated circuit manufacturing.The projection lens is the core component of the lithographic system,and its imaging quality determines the lithographic resolution and critical dimension.Wavefront aberration is an important parameter to evaluate the imaging quality of lithographic projection lens.A highprecision wavefront aberration measurement device is necessary for the installation and adjustment of lithographic projection lens.Phase extraction is an important step in wavefront aberration measurement using double-grating Ronchi phase-shift lateral shearing interferometry,which directly affects the final measurement accuracy.There is parasitic interference of multi-level high diffraction orders in the double-grating Ronchi lateral shearing interference field.The traditional phase extraction algorithms cannot eliminate the impact of high diffraction orders,which seriously reduces the accuracy of phase extraction.The high-precision shear phase extraction algorithm can improve the accuracy of wavefront aberration measurement of projection lens.Eliminating the impact of high diffraction orders is very important to improve the measurement accuracy of Ronchi lateral shearing interferometry.In this paper,a high-precision shear phase extraction algorithm is proposed based on the double-grating Ronchi lateral shearing interferometry.Methods In this paper,based on the double-grating Ronchi lateral shearing interferometry for the projection lens wavefront aberration measurement technology and system,the shear phase extraction algorithm is studied.The shear phase between+1 and-1 diffraction orders is calculated directly through the double-grating Ronchi shearing interferograms,and the impact of all high diffraction orders in the double-grating Ronchi shearing interference field is eliminated to improve the measurement accuracy of Ronchi shearing interferometry.In this paper,the phase extraction error of the Ronchi lateral shearing interferom

关 键 词：干涉测量 Ronchi剪切干涉 相位提取 波像差检测 光刻投影物镜 剪切率 

分 类 号：O436[机械工程—光学工程]