含钽铝锭俄歇电子能谱分析  

Auger electron spectroscopy analysis of aluminum ingots containing tantalum

作　　者：马贤 王丁丁[1] 刘欢[1,2] Ma Xian;Wang Dingding;Liu Huan(Research Institute of Physics and Chemical Engineering of Nuclear Industry,Tianjin 300180,China)

机构地区：[1]核工业理化工程研究院,天津300180 [2]粒子输运与富集技术全国重点实验室,天津300180

出　　处：《分析仪器》2024年第4期36-40,共5页Analytical Instrumentation

摘　　要：在电子束蒸镀铝膜过程中,高熔点的杂质钽很难从铝锭中去除,对蒸镀过程产生影响,需明确钽对铝锭的作用形式。针对电子束加热蒸镀后的含钽铝锭样品中钽的存在形式进行研究,利用扫描电子显微镜、X射线衍射仪、俄歇电子能谱仪进行微观形貌、表面物相、微区成分分析,着重对俄歇电子能谱测试过程中样品制备与处理对结果的影响进行讨论。结果表明:钽在铝锭中以Al_(3)Ta及单质形式存在;俄歇电子能谱结果受表面状态影响明显,必要时需结合氩离子溅射技术进行表面清洁。In the process of electron beam evaporation,tantalum with high melting point is difficult to be removed from aluminum ingots,which has an impact on the evaporation process.The action form of tantalum on aluminum ingots needs to be clarified.The existence form of tantalum in tantalum-containing aluminum ingot samples after electron beam heating and evaporation was studied.Scanning electron microscope,X-ray diffractometer and Auger electron spectrometer were used to analyze the micro-morphology,surface phase and micro-region composition,and the influence of sample preparation and treatment on the results of Auger electron spectrometer test was discussed.The results show that tantalum exists in the form of Al3Ta and its elemental substance in aluminum ingots.The result of Auger electron spectrum is obviously affected by the surface state,and the surface cleaning should be combined with argon ion sputtering technology if necessary.

关 键 词：含钽铝锭 俄歇电子能谱 微区分析 金属钽 表面状态 

分 类 号：O657.62[理学—分析化学] TG178[理学—化学]