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作 者:曹聪 周芷伟 吴克平[2] 朱志刚[2] 黄智弘 CAO Cong;ZHOU Zhiwei;WU Keping;ZHU Zhigang;HUANG Zhihong(University of Science and Technology of China,Hefei 230026,China;Hefei lnstitutes of Physical Science,Chinese Academy of Sciences,Hefei 230031,China)
机构地区:[1]中国科学技术大学,合肥230026 [2]中国科学院合肥物质科学研究院,合肥230031
出 处:《真空与低温》2024年第5期566-571,共6页Vacuum and Cryogenics
基 金:聚变堆主机关键系统综合研究设施CRAFT低温系统(2018-000052-73-01-001228);2022年中国科学院改善科研条件专项(1ZGSZXKYZB20220061)。
摘 要:核聚变装置通常在超低温环境下运行,对温度的精确测量有着严苛的要求。超低温环境下的温度精确测量与标定直接影响着核聚变、高能物理、航空航天等涉及超低温环境的研究领域的发展。根据聚变堆主机系统综合研究设施CRAFT的测试条件,设计了液氦温度计标定平台,可开展1.8~300 K温区内的温度标定与实验研究。该平台通过吉福德-麦克马洪循环制冷机(GM制冷机)以及毛细管节流制冷,实现样品腔降温至1.8 K;通过调节加热器功率控制样品腔温度,可实现1.8~20 K温区内±5 mK波动、20~300 K温区内±15 mK波动的温度环境条件。使用低温测量控制设备对标定区域进行不同温度点位的控温和数据采集,最终得到标定精度结果为:1.8~4.2 K时为±9.54 mK;4.2~20 K时为±22.44 mK;20~300 K时为±346.78 mK。The precise measurement of temperature is crucial for nuclear fusion devices operating in ultra-low temperature magnetic field environments.The accurate temperature measurement and calibration in ultra-low temperature environment has a direct impact on the development of nuclear fusion,high energy physics,aerospace and other research fields involving ultra-low temperature environment.Relying on the comprehensive research facility CRAFT for fusion reactor host systems,a liquid helium temperature calibration platform has been designed to carry out temperature calibration and experimental research in the temperature range of 1.8 K to 300 K.The platform uses the Gifford-McMahon Cycle Chiller(GM Chiller)and capillary throttling refrigeration to cool the sample chamber to 1.8 K.By controlling the temperature of the sample chamber by adjusting the heater power,the temperature environment of±5 mK fluctuation in the temperature zone of 1.8 K to 20 K and±15 mK fluctuation in the temperature zone of 20 K to 300 K can be achieved.Low-temperature measurement and control equipment are used for temperature control and data acquisition at different temperature points in the calibration area,resulting in a calibration accuracy of±4.39 mK at 1.8 K to 4.2 K,±6.08 mK at 4.2 K to 20 K,and±75.62 mK at 20 K to 300 K.
分 类 号:TB772[一般工业技术—真空技术]
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