碲锌镉晶片的X射线貌相研究  

X-Ray Topography Study of CdZnTe

作　　者：李乾 韩岗 牛佳佳 李达 刘江高 折伟林[1] LI Qian;HAN Gang;NIU Jia-jia;LI Da;LIU Jiang-gao;SHE Wei-lin(North China Research Institute of Electro-Optics,Beijing 100015,China)

机构地区：[1]华北光电技术研究所,北京100015

出　　处：《红外》2024年第8期13-17,共5页Infrared

摘　　要：X射线貌相测试是一种针对样品晶体结构完整性的非破坏性检测手段。通过高分辨率数字式X射线形貌仪对碲锌镉(111)晶片表层进行貌相测试,通过缺陷形式及密度来评价碲锌镉晶体质量。经过大量数据分析统计出5种常见于碲锌镉晶体中的缺陷:划痕、空洞、小角晶界、孪晶和杂晶。结合具体工艺阐述和分析了5类缺陷的形成原因,并针对碲锌镉晶体生长和加工工艺提出了建设性意见。这有利于获取高质量衬底材料,进而提升外延碲镉汞膜的质量。X-ray morphology testing is a non-destructive testing method for detecting the integrity of the crystal structure of samples. Surface morphology testing of tellurium zinc cadmium (111) wafers was conducted using a high-resolution digital X-ray morphometer, and the quality of tellurium zinc cadmium crystals was evaluated by defect form and density. After extensive data analysis, five common defects in tellurium zinc cadmium crystals have been identified: scratches, voids, small angle grain boundaries, twinning and impurities. Based on specific processes, the reasons for the formation of 5 types of defects were explained and analyzed, and constructive suggestions were put forward for the growth and processing technology of tellurium zinc cadmium crystals, which is conducive to obtaining high-quality substrate materials and improving the quality of epitaxial tellurium cadmium mercury films.

关 键 词：碲锌镉 X射线 缺陷 貌相 

分 类 号：TN213[电子电信—物理电子学]