闭合场-磁控溅射制备Ti掺杂MoS_(2)复合薄膜及其摩擦学性能研究  

Preparation and Characterization of Ti Dopped MoS_(2) Composite Films Deposited by Closed-Field-Magnetron Sputtering and their Tribological Properties

作　　者：王伟奇 陈欣仪 赵旋 林鑫 田广科[1] 郭月霞 王锐东 令晓明[1] WANG Weiqi;CHEN Xinyi;ZHAO Xuan;LIN Xin;TIAN Guangke;GUO Yuexia;WANG Ruidong;LING Xiaoming(National Engineering Research Center for Technology and Equipment of Environmental Deposition,Lanzhou Jiaotong University,Lanzhou Gansu 730000,China;Key Laboratory of Opto-Electronic Technology and Intelligent Control Ministry of Education,Lanzhou Jiaotong University,Lanzhou Gansu 730000,China;College of Civil Engineering,Lanzhou Jiaotong University,Lanzhou Gansu 730000,China)

机构地区：[1]兰州交通大学国家绿色镀膜技术与装备工程技术研究中心,甘肃兰州730000 [2]兰州交通大学光电技术与智能控制教育部重点实验室,甘肃兰州730000 [3]兰州交通大学土木工程学院,甘肃兰州730000

出　　处：《润滑与密封》2024年第8期28-35,共8页Lubrication Engineering

基　　金：甘肃省自然科学基金项目(21JR7RA337.21JR11RA059);国家重点研发计划项目(2021YFB3500100);兰州交通大学青年科学基金项目(2021028);甘肃省高等学校创新基金项目(2021B-094)。

摘　　要：采用闭合场-磁控溅射沉积技术,通过调节沉积过程中钛靶的溅射电流,分别在单晶Si(100)和304不锈钢基底上制备不同含量Ti掺杂MoS_(2)复合薄膜。利用场发射扫描电子显微镜、X射线光电子能谱仪和透射电子显微镜表征薄膜的形貌、微观结构及元素含量;利用纳米压痕仪、球-盘摩擦试验机系统考察薄膜的力学性能和在大气环境下的摩擦学性能及其与薄膜中Ti元素含量之间的关系。结果表明:随着溅射电流增加,薄膜中Ti元素含量增加、MoS_(2)晶粒的生长尺寸变小,使MoS_(2)由尺寸较大的层状结构向短程有序、长程无序的无定型非晶结构转变。尤其在钛靶电流为1.0 A条件下制备的Ti元素原子分数为18.55%的Ti/MoS_(2)复合薄膜表现出较好的致密性和硬度,同时Ti元素相比于MoS_(2)可以在摩擦界面处优先与O结合,使薄膜中MoS_(2)抗氧化性能提升,从而改善了薄膜的摩擦学性能。The Ti-doped MoS_(2) composite films were prepared on single-crystal Si(100)and 304 stainless steel substrates by adjusting the sputtered Ti targets at different currents using closed-field-magnetron sputtering deposition technique,respectively.The morphology,microstructure and the element content of the films were characterized using field emission scanning electron microscopy,X-ray photoelectron spectroscopy and transmission electron microscopy.The mechanical and tribological properties of the films under atmospheric conditions were evaluated by using nanoindentation and ball-on-disk friction testing device as a function of the content of Ti in the films.The results demonstrate that the content of Ti element in the composites films increases with increasing sputtering current,which can effectively obstruct the growth size of MoS_(2) crystallites during the deposition process,thus transforming MoS_(2) from a lamellar structure with large size to amorphous structure with ordered in short-range and disordered in long-range.Especially,the Ti/MoS_(2) composite films with Ti element atomic fraction of 18.55%prepared at a sputtering current of 1.0 A exhibit desirable densities and hardness,while the Ti element preferentially bound with O at the friction interface compared with MoS_(2),which improves the MoS_(2) oxidation resistance and enhances the tribological properties of the film.

关 键 词：闭合场-磁控溅射 MoS_(2)润滑薄膜 摩擦学性能 力学性能 

分 类 号：TH117.1[机械工程—机械设计及理论]