Self-aligned dual-beam superresolution laser direct writing with a polarization-engineered depletion beam  

作　　者：GUOLIANG CHEN DEWEI MO JIAN CHEN QIWEN ZHAN 

机构地区：[1]School of Optical-Electrical and Computer Engineering,University of Shanghai for Science and Technology,Shanghai 200093,China [2]Shanghai Key Laboratory of Modern Optical System,University of Shanghai for Science and Technology,Shanghai 200093,China [3]Zhangjiang Laboratory,Shanghai 201204,China

出　　处：《Photonics Research》2024年第6期1194-1200,共7页光子学研究（英文版）

基　　金：National Natural Science Foundation of China(12274299,92050202);Science and Technology Commission of Shanghai Municipality(22QA1406600);Natural Science Foundation of Shanghai Municipality(20ZR1437600).

摘　　要：A fiber-based,self-aligned dual-beam laser direct writing system with a polarization-engineered depletion beam is designed,constructed,and tested.This system employs a vortex fiber to generate a donut-shaped,cylindrically polarized depletion beam while simultaneously allowing the fundamental mode excitation beam to pass through.This results in a co-axially self-aligned dual-beam source,enhancing stability and mitigating assembly complexities.The size of the central dark spot of the focused cylindrical vector depletion beam can be easily adjusted using a simple polarization rotation device.With a depletion wavelength of 532 nm and an excitation wavelength of800 nm,the dual-beam laser direct writing system has demonstrated a single linewidth of 63 nm and a minimum line spacing of 173 nm.Further optimization of this system may pave the way for practical superresolution photolithography that surpasses the diffraction limit.

关 键 词：POLARIZATION BEAM depletion 

分 类 号：TN249[电子电信—物理电子学]