低共熔溶剂中乙醇添加对激光选区熔化GH4169合金电化学抛光行为的影响  

Effect of Ethanol Addition in Eutectic Solvent on Electrochemical Polishing Behavior of GH4169 Alloy by Selective Laser Melting

作　　者：王超群 吴松全 杨义 王皞 黄爱军 WANG Chaoqun;WU Songquan;YANG Yi;WANG Hao;HUANG Aijun(University of Shanghai for Science and Technology,Shanghai 200093,China;Jiangxi Copper Technology Institute Co.,Ltd.,Nanchang 330096,China;Monash University,Clayton VIC 3800,Australia)

机构地区：[1]上海理工大学,上海200093 [2]江西铜业技术研究院有限公司,南昌330096 [3]Monash University,Clayton VIC 3800,Australia

出　　处：《航空制造技术》2024年第12期71-78,共8页Aeronautical Manufacturing Technology

基　　金：国家自然科学基金面上项目(52271108);上海市自然科学基金面上项目(21ZR1445100);上海高性能医疗器械材料工程技术研究中心项目(20DZ2255500);西安市高性能钛合金材料重点实验室开放基金项目(NIN-HTL-2022-02)。

摘　　要：激光选区熔化GH4169合金的高表面粗糙度是其应用过程中需要解决的一大难题,为了替代传统电化学抛光(电抛)使用的酸基电解液,本研究采用绿色安全的氯化胆碱-乙二醇体系作为低共熔溶剂(DES)对激光选区熔化GH4169合金进行电抛的研究。以电抛前后试样的表面形貌、粗糙度、光泽度、润湿角和电化学工作站测试的结果为指标,探索在氯化胆碱-乙二醇中加入不同摩尔比例的乙醇对试样表面电抛效果的影响。结果表明,电抛后的试样表面质量得到了显著的改善。其中,在氯化胆碱∶乙二醇∶乙醇摩尔比1∶1.9∶0.1,电抛参数为温度60℃、时间30 min、电压3 V、磁子转速240 r/min和电极间距13 mm时,试样表面被整平抛亮,抛光效果最好,粗糙度Ra达到(0.403±0.010)μm,光泽度达到(357.9±2.2)GU,润湿角以及电化学行为也验证了电抛后的试样表面更有利于耐蚀性。同时,探讨了合金在氯化胆碱-乙二醇体系中的电抛机理。The high surface roughness of selective laser melting GH4169 alloy is a challenge that need to be resolved in its application.To replace the traditional acid based electrolyte,choline chloride-ethylene glycol system(Deep eutectic solvent,DES) was used for electrochemical polish GH4169 alloy fabricated by selective laser melting.In order to explore the ethanol addition effect on the electrochemical polishing behavior of the alloy,surface morphology,roughness,glossiness,wetting angle and electrochemical properties before and after electrochemical polishing have been investigated.The result indicates that the surface quality of the specimens after electrochemical polishing has been significantly improved.Among them,when the molar ratio of choline chloride∶ethylene glycol∶ethanol is of 1∶1.9∶0.1,and the processing parameters are of temperature 60 ℃,time 30 min,voltage 3 V,magneton rotation speed 240 r/min and electrode spacing 13 mm,the surface of the specimen shows much more smooth and bright,and the roughness Ra is(0.403 ± 0.010)μm,and the glossiness is(357.9 ± 2.2) GU.The wetting angle and electrochemical properties have also verified that the surface of the sample after electrochemical polishing is more beneficial to corrosion resistance.Meanwhile,the mechanism of the alloy electrochemical polishing in choline chloride-ethylene glycol system has also been discussed.

关 键 词：高温合金 激光选区熔化(SLM) 电化学抛光 表面粗糙度 表面光泽度 

分 类 号：TG175[金属学及工艺—金属表面处理]