单磨头瓷砖抛光工艺参数对磨削均匀性的影响  

Influence of Single Grinding Head Ceramic Tile Polishing Process Parameters on Grinding Uniformity

作　　者：韩文 杨振恒 隋旭东 徐磊 曾时金 于盛睿 徐晗 HAN Wen;YANG Zhenheng;SUI Xudong;XU Lei;ZENG Shijin;YU Shengrui;XU Han(Jingdezhen Ceramic University,Jingdezhen 333403,Jiangxi,China;Keda Industrial Group Co.,Ltd.,Foshan 528313,Guangdong,China)

机构地区：[1]景德镇陶瓷大学,江西景德镇333403 [2]科达制造股份有限公司,广东佛山528313

出　　处：《陶瓷学报》2024年第4期805-811,共7页Journal of Ceramics

基　　金：景德镇市陶瓷产业重大产学研协同攻关和成果转化项目(2023ZDGC003);校企合作项目(KD-XMLX-20231244)。

摘　　要：针对瓷砖抛光生产中出现的过抛、漏抛等严重影响产品质量的问题,基于Preston方程和磨头外轮廓轨迹方程,建立了抛光工艺参数和运动参数与过抛、漏抛相关变量间的数学模型。仿真分析结果表明:过抛区域主要集中在抛光轨迹重叠区域,少部分分布在轨迹的上下弧形区域;当改变抛光工艺参数时,随着无漏抛区域宽度变大,重叠区域的面积也随之变大。通过调整抛光工艺参数不仅可在无漏抛区域宽度减少17.91%,还能使得重叠面积减少53.06%,极大改善了过抛情况,有效地提升了磨削均匀性,为后续实际生产中抛光轨迹的优化提供理论基础。This paper was aimed to address the serious issues of over-polishing and under-polishing in the production of ceramic tiles,which significantly affect product quality.Mathematical models were established to correlate polishing process parameters and motion parameters with variables related to over-polishing and under-polishing,based on the Preston equation and the grinding head outer profile trajectory equation.According to the simulation analysis results,it is revealed that over-polishing primarily occurs in the overlapping regions of the polishing trajectory,with a smaller proportion distributed in the upper and lower arc regions of the trajectory.As the polishing process parameters are modified,an increase in the width of the leak-free polishing zone corresponds to an enlargement of the overlapping area.It is possible to reduce the width of the leak-free polishing zone by 17.91%,simultaneously resulting in a 53.06%reduction in the overlapping area,by adjusting the polishing process parameters.This significant improvement effectively enhances the over-polishing situation,markedly promoting grinding uniformity.These findings offer a theoretical foundation for optimizing polishing trajectories in practical production of ceramic tiles.

关 键 词：均匀性 抛光工艺参数 磨削 Preston方程 仿真分析 

分 类 号：TQ174.5[化学工程—陶瓷工业]