基于磁控溅射技术的钴掺杂氧化铜薄膜的LIBS多维度分析研究  

Multidimensional Analysis of Cobalt-Doped Copper Oxide Thin Films Based on Magnetron Sputtering with LIBS

作　　者：董丽丽 吴家森 夏祥宇 武传奇 修俊山 Dong Lili;Wu Jiasen;Xia Xiangyu;Wu Chuanqi;Xiu Junshan(School of Chemistry and Chemical Engineering,Shandong University of Technology,Zibo 255000,Shandong,China;School of Physics and Optoelectronic Engineering,Shandong University of Technology,Zibo 255000,Shandong,China)

机构地区：[1]山东理工大学化学化工学院,山东淄博255000 [2]山东理工大学物理与光电工程学院,山东淄博255000

出　　处：《中国激光》2024年第13期269-276,共8页Chinese Journal of Lasers

基　　金：国家自然科学基金(11704228);山东省自然科学基金(ZR2022MA044)。

摘　　要：通过磁控溅射技术制备了一系列不同溅射压强和功率下的钴(Co)掺杂氧化铜(CuO)薄膜,利用激光诱导击穿光谱(LIBS)技术实现了该薄膜的多维度分析。绘制了不同溅射压强和功率下薄膜中Co/Cu元素含量比的定标曲线,线性拟合系数均超过0.99,显示了LIBS强度比与薄膜中元素含量比有很好的一致性,实现了薄膜中元素含量比的快速定量分析。由纳米薄膜中Co/Cu的LIBS强度比的二维映射结果可知:Co/Cu强度比随溅射压强的增加先变大后减小再增大;随着溅射功率的增加,Co/Cu强度比减小,分布均匀性变差。薄膜的透过率光谱分析结果显示,当溅射压强为3.0 Pa和溅射功率为75 W时,薄膜禁带宽度达到了较大的值,且薄膜光学禁带宽度与Co/Cu的LIBS强度比随溅射参数变化的趋势是一致的,为薄膜的光学性能评估提供了LIBS技术支持。研究结果表明,LIBS技术可以实现磁控溅射制备的Co掺杂CuO薄膜的多维度分析。Objective With the rapid advancement of research in nanomaterials, many functional oxide nanofilms have been widely used in various fields. CuO films are low-cost, excellent thin film materials. Elemental doping is possible because of the presence of Cu vacancies in the structure. Co-doped CuO films are prepared by doping Co in CuO thin films. Radio frequency(RF) magnetron sputtering, a method for preparing thin-film materials, has been widely used in scientific research and industrial fields because of its stability and high film-forming quality. However, during the preparation of Co-doped CuO film materials, changes in the magnetron sputtering parameters often lead to differences in the composition ratio, resulting in different sample performances. Therefore, it is necessary to analyze the composition ratio of prepared Co-doped CuO films to analyze the performance of the samples and optimize the process parameters for magnetron sputtering. For this purpose, an existing effective analytical method is used to perform a multidimensional analysis of the composition ratio for the prepared Co-doped CuO films by RF magnetron sputtering at different sputtering parameters.Methods Co-doped CuO films are prepared by magnetron sputtering under different sputtering pressures and powers. The composition ratios of the samples are influenced by sputtering pressure and power, as listed in Table 1. In this study, a multidimensional analysis of Co-doped CuO films is conducted using laser-induced breakdown spectroscopy(LIBS), including quantitative analysis of the element atomic number fraction ratio, two-dimensional mapping of the LIBS intensity ratios of Co/Cu in the films, and optical performance evaluation of the films.Results and Discussions The LIBS experimental setup(Fig. 1) and the corresponding LIBS spectra of the Co-doped CuO films(Fig. 2) are shown. Plotted calibration curves of the Co/Cu content ratios in the films under different sputtering pressures and powers show that the linear fitting coefficient exceeds 0.99. Th

关 键 词：光谱学 激光诱导击穿光谱 磁控溅射技术 钴掺杂氧化铜薄膜 多维度分析 

分 类 号：O433.4[机械工程—光学工程]