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机构地区:[1]MS2Discovery Interdisciplinary Research Institute,Wilfrid Laurier University,Waterloo,Ontario,N2L3C5,Canada [2]Department of Chemical Engineering,Indian Institute of Technology(BHU),Varanasi,221005,India
出 处:《Particuology》2024年第8期72-87,共16页颗粒学报(英文版)
摘 要:A CFD-DEM model is developed for chemical vapour deposition of silane in a fluidized bed reactor to investigate the effect of polydispersity on local phase dynamics,mass and heat transport,as well as the rate of Si deposition.Both gas-phase fines formation and heterogeneous deposition on the seed particle,as well as the scavenging effect for Si particle growth,are incorporated.The method is first validated against the experimentally measured Si deposition rate,percentage of fine production and minimum fluidisation velocity.Subsequently,the properties,primarily particle intermixing,fluidisation behaviour and bubble dynamics along with the deposition process,are analyzed for several polydisperse beds under various operating conditions.The effect of polydispersity of the bed on a fraction of the bubble size,dense phase expansion and interchange coefficient between various phases is thoroughly investigated to establish a correlation with reactor performance.The results show that broad-Gaussian particle size distribution(PSD)exhibits excellent improvement in fluidisation behaviour,resulting in a high deposition rate,and minimum formation of Si fines.
关 键 词:CFD-DEM method Chemical vapour deposition(CVD) Particle size distribution Silicon Gas-solid fluidized bed
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