HITACHI SU5000热场发射扫描电镜的使用及参数选择  

Usage and Preferences of HITACHI SU5000 Thermal Field Emission Scanning Electron Microscope

作　　者：洪雅真 HONG Ya-zhen(College of Chemical Engineering,Huaqiao University,Fujian Xiamen 361021,China)

机构地区：[1]华侨大学化工学院,福建厦门361021

出　　处：《广州化工》2024年第17期119-121,125,共4页GuangZhou Chemical Industry

基　　金：华侨大学2023年实验教学与管理改革课题(SY2023G02)。

摘　　要：以HITACHI SU5000热场发射扫描电镜为例,以金银核壳纳米棒、ZIF-8、碳酸钙纳米微球和聚苯乙烯微球为研究对象,探讨不同参数对扫描电镜图像质量的影响。结果显示,对于导电性良好的样品,选择较高加速电压搭配适宜束流强度,可得到高分辨率的样品形貌。对于半导体样品,选择合适的电压,根据放大倍数来调整束流强度。对于不导电样品,电压和束流过低,聚焦困难;适当提高加速电压,增加电子束的穿透深度,可显著减少荷电现象,图像质量得到改善。By taking the thermal FE-SEM of Hitachi SU5000 as an example,the effects of different parameters selection on the image quality of the samples were studied with gold and silver core-shell nanorods,ZIF-8,calcium carbonate nanospheres,and polystyrene microsphere,among others.The results indicated that high-resolution sample morphology could be obtained by choosing high acceleration voltage and appropriate beam intensity for the samples with good electrical conductivity.In the case of semiconductor samples,a suitable voltage could be selected,and the beam intensity should be adjusted according to the magnification.In the case of poor conductivity samples,the extremely low acceleration voltage and beam current might led to poor image quality and difficulty in focusing.The charge effect could be significantly reduced,remarkably improving the image quality by increasing the acceleration voltage and increasing the penetration depth of the electron beam.

关 键 词：场发射扫描电镜 参数选择 荷电 加速电压 

分 类 号：TN16[电子电信—物理电子学]