典型半导体工艺测量设备计量技术  

Measurement technology for typical semiconductor process measurement equipment

作　　者：崔现锋[1] Cui Xianfeng(The 13th Institute of CETC)

机构地区：[1]中国电子科技集团公司第十三研究所

出　　处：《上海计量测试》2024年第4期2-7,共6页Shanghai Measurement and Testing

摘　　要：半导体测量设备主要用于监测晶圆上膜厚、线宽、台阶高度、电阻率等工艺参数,实现器件各项参数的准确控制,进而保障器件的整体性能。为了解半导体测量设备的溯源情况,实现测量设备量值的统一与准确,通过研究台阶仪、椭偏仪、扫描电子显微镜以及四探针测试仪四种典型半导体测量设备的计量方法,分析典型测量设备量值溯源中的关键要素,探讨构建多维度计量数据模型库,科学决策设备计量管控周期和应急计量需求,建立基于数据的计量管控决策机制的可行性,为设备采购、验收、使用以及维护等提供精确保障。Semiconductor measurement equipment is mainly used to monitor process parameters on the wafer such as film thickness,line width,step height,and resistivity,to achieve accurate control of various device parameters and ensure the overall performance of the device.In order to understand the traceability of semiconductor measurement equipment and achieve unified and accurate measurement values,this study analyzes the key elements of measurement technology in typical semiconductor measurement equipment by studying the measurement techniques of several typical semiconductor measurement equipment such as stylus profiler,ellipsometers,scanning electron microscopes,and four probe testers.A multi-dimensional measurement data model library is constructed to scientifically determine the measurement control cycle and emergency measurement needs of equipment,and a data-based measurement control decision-making mechanism is established to provide precise guarantees for equipment procurement,acceptance,use,and maintenance.

关 键 词：测量设备 量值准确 计量数据模型库 计量管控决策机制 

分 类 号：F203[经济管理—国民经济] TN30[电子电信—物理电子学]