Research Progress on Planar DC Magnetron Sputtering Non-evaporable Getter (NEG) Films  

平面直流磁控溅射NEG薄膜研究进展

作　　者：Wei Ningfei Meng Jun Luo Cheng Yang Weishun Xie Wenjun Jiao Jiqiang Ma Xiangli 魏宁斐

机构地区：[1]不详

出　　处：《IMP & HIRFL Annual Report》2022年第1期298-298,共1页中国科学院近代物理研究所和兰州重离子研究装置年报（英文版）

摘　　要：Based on the technology of DC magnetron sputtering,the Vacuum Technology Group at IMP have developed a large-scale multi-target magnetron sputtering coating device.As shown in Fig.1,it is mainly composed of four parts,i,e,the coating chamber,the evacuation system,the cooling system and the control system.The coating chamber is installed with compound vacuum gauge and temperature sensor,which can accurately measure the pressure and temperature.

关 键 词：COATING TEMPERATURE SYSTEM 

分 类 号：TB43[一般工业技术]