原位合成MoS_(2)/TiO_(2)复合膜层的减磨机理  

Anti-friction mechanism of in-situ synthesized MoS_(2)/TiO_(2)composite coating

在线阅读下载全文

作  者:宁炳坤 杨泽慧 钱伟峰 姜超平[1] 赵秦阳 陈永楠[1] NING Bingkun;YANG Zehui;QIAN Weifeng;JIANG Chaoping;ZHAO Qinyang;CHEN Yongnan(School of Materials Science and Engineering,Chang’an University,Xi’an 710064,China)

机构地区:[1]长安大学材料科学与工程学院,西安710064

出  处:《中国有色金属学报》2024年第9期3013-3023,共11页The Chinese Journal of Nonferrous Metals

基  金:国家自然科学基金资助项目(52271051);陕西省“科学家+工程师”队伍建设项目(2023KXJ-272);中央高校基本科研业务费专项资金资助项目(300102312407)。

摘  要:通过研究MoS_(2)/TiO_(2)复合膜层与金刚石磨球摩擦界面的相互作用及摩擦过程界面位错变化,揭示原位合成MoS_(2)/TiO_(2)复合膜层的减磨机理。结果显示:原位合成的MoS_(2)/TiO_(2)复合膜层在分子动力学模拟摩擦过程中磨屑原子分散堆积在膜层表面,减小了膜层所受切向应力,并将应力分散到膜层,从而缓解磨痕处应力集中。MoS_(2)-S10%膜层原子堆积最少,摩擦因数稳定在0.2左右,具有良好的摩擦性能;由于摩擦过程中膜层表面形成MoS_(2)润滑膜,该膜在受到破坏后下层MoS_(2)逐渐向上迁移修复该膜,使膜层保持低摩擦因数,因而MoS_(2)-S10%膜层具有较好的减磨性能。同时,原位合成的MoS_(2)/TiO_(2)界面为非共格界面,可以湮灭位错降低位错密度,促进位错运动,从而提高膜层的减磨性能。该研究结果为揭示减磨材料减磨机理提供了新思路和新方法。The wear reduction mechanism of in-situ synthesized MoS_(2)/TiO_(2)composite coating by studying the interaction between the friction interface of the MoS_(2)/TiO_(2)composite coating and the diamond grinding ball,and the interfacial dislocation changes during the friction process were revealed.The results show that the in-situ synthesized MoS_(2)/TiO_(2)composite coating disperses and accumulates abrasive atoms on the coating surface during the molecular dynamics simulation of friction process,which reduces the tangential stress on the coating and disperses the stress on the coating to alleviate the stress concentration at the abrasion marks.MoS_(2)-S10%coating has the least atomic buildup,the coefficient of friction is stable at about 0.2,and it has good wear reduction performance,due to the formation of a layer of MoS_(2)lubrication coating on the surface of the coating during friction,and after the coating is damaged,the lower layer of MoS_(2)gradually migrates upward to repair the coating,so that the coating maintains a low coefficient of friction.At the same time,the in-situ synthesized MoS_(2)/TiO_(2)interface is a noncoherent interface,which can annihilate the dislocations to reduce the density of dislocations and promote the movement of interfacial dislocations,thus improving the wear-reducing performance of the coating.

关 键 词:MoS_(2)/TiO_(2)复合膜层 硫源浓度 摩擦磨损 分子动力学 位错 

分 类 号:TG174.4[金属学及工艺—金属表面处理] TG146.23[金属学及工艺—金属学]

 

参考文献:

正在载入数据...

 

二级参考文献:

正在载入数据...

 

耦合文献:

正在载入数据...

 

引证文献:

正在载入数据...

 

二级引证文献:

正在载入数据...

 

同被引文献:

正在载入数据...

 

相关期刊文献:

正在载入数据...

相关的主题
相关的作者对象
相关的机构对象