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作 者:徐桂芝 杜小泽[1] 胡晓 宋洁 XU Guizhi;DU Xiaoze;HU Xiao;SONG Jie(School of Energy Power and Mechanical Engineering,North China Electric Power University,Beijing 102206,China;State Key Laboratory of Advanced Power Transmission Technology,State Grid Smart Grid Research Institute Co.,Ltd.,Beijing 102209,China)
机构地区:[1]华北电力大学能源动力与机械工程学院,北京102206 [2]先进输电技术国家重点实验室(国网智能电网研究院有限公司),北京102209
出 处:《中国腐蚀与防护学报》2024年第5期1370-1376,共7页Journal of Chinese Society For Corrosion and Protection
基 金:国家重点研发计划(2021YFB4000100);国家电网有限公司科技资助项目(521532220014)。
摘 要:采用直流脉冲磁控溅射技术在TA4钛双极板表面成功制备了Pt涂层,涂层的存在显著提高了TA4在质子交换膜制氢电解池阳极环境中的界面导电性能。随着沉积时间的延长,Pt涂层的厚度从约0.29μm增长到约0.95μm,晶格常数从5 min的0.39112 nm增加到15 min的0.39128 nm;电化学研究表明Pt涂层样品的开路电位比TA4高约0.77 V。延长沉积时间可进一步增大界面电化学反应阻力,体现在电荷转移电阻随制备时间的延长而逐渐增加,分别为5.52×10^(4),5.91×10^(4)和6.10×10^(4)Ω·cm^(2)。最重要的是,Pt涂层可以有效提高并维持界面优异的导电性能,模拟稳态极化测试后的界面接触电阻仅发生略微增长。Pt coatings were successfully deposited on the surface of TA4 Ti-alloy using the DC pulse magnetron sputtering technique.With the increasing deposition time,the lattice constants of Pt coating increased from 0.39112 nm at 5 min to 0.39128 nm at 15 min,correspondingly the thickness increased from approximately 0.29μm to around 0.95μm.Electrochemical studies revealed that the open circuit voltage(OCP)of Pt-coated TC4 was approximately 0.77 V higher than that of the plain TA4.With the extension of deposition time,the interfacial electrochemical reaction resistance further increases,as a result,its charge transfer resistance will gradually increase with deposition time as described as below:5.52×10^(4),5.91×10^(4),and 6.1×10^(4)Ω·cm^(2),respectively.Importantly,the Pt coating effectively enhanced and maintained the excellent interface conductivity,as the interface contact resistance(ICR)only exhibited a slight increase after a simulated steady-state polarization testing.In sum,the Pt coating can significantly enhance the interfacial conductivity of TA4 in the anode side environment of proton exchange membrane hydrogen electrolyzer(PEMWE).
关 键 词:质子交换膜制氢电解池 双极板 Pt涂层 电化学阻抗 界面接触电阻
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