干摩擦工况下氮化硅基底制备CrAlN涂层工艺参数优化  

Optimization of Process Parameters for CrAlN Coating on Silicon Nitride Substrates under Dry Friction Conditons

作　　者：陆鹤 吴玉厚 刘子金 王贺 闫广宇 白旭 郭建成 郑桐翔 Lu He;Wu Yuhou;Liu Zijin;Wang He;Yan Guangyu;Bai Xu;Guo Jiancheng;Zheng Tongxiang

机构地区：[1]沈阳建筑大学机械工程学院 [2]现代建筑工程装备与技术国际合作联合实验室

出　　处：《工具技术》2024年第10期20-26,共7页Tool Engineering

基　　金：国防科技创新特区计划项目(20-163-00-TS-006-002-11);国家外国专家项目(G2022006012L)。

摘　　要：为了延长氮化硅材料在干摩擦工况下的使用寿命,采用射频磁控溅射技术在氮化硅基底制备CrAlN涂层。利用正交试验法,以CrAlN涂层的干摩擦磨损率为试验指标,探究溅射时间、基底温度、氮气流量和溅射功率对涂层干摩擦工况下摩擦学性能的影响。利用超景深显微镜、扫描电子显微镜(SEM)、X射线衍射仪(XRD)、摩擦磨损试验机、轮廓粗糙度测试仪和能谱仪(EDS)分析CrAlN涂层的微观形貌、晶体结构、化学成分和表面摩擦学性能,得到优化的工艺参数。分析结果表明,基底温度和溅射功率对CrAlN涂层磨损率的影响程度较大,溅射时间和氮气流量对CrAlN涂层磨损率的影响程度较小。在溅射时间为240min、基底温度为350℃、氮气流量为40sccm和溅射功率为120W的工艺参数下,CrAlN涂层的干摩擦摩擦学性能较好。研究结果可为氮化硅基底在干摩擦工况下应用CrAlN涂层的工艺参数设定提供数据支撑。In order to extend the service life of silicon nitride ceramic under dry friction conditions,CrAlN coatings are prepared on silicon nitride substrates by radio frequency magnetron sputtering technology.Using orthogonal test method,the wear rate of CrAlN coating as the test index,the influence of sputtering time,substrate temperature,nitrogen flow and sputtering power is explored.X-ray diffraction(XRD),field emission scanning electron microscope(SEM),friction and wear tester,ultra-depth-of-field microscope,the energy spectrometer(EDS)are used to analyze the coating′s microscopic morphology,crystalline structure,chemical composition,and surface tribological properties,finally the optimized process parameters are obtained.The results of the polar analysis of the orthogonal test show that the substrate temperature and sputtering power have a greater influence on the coating wear rate,while the sputtering time and nitrogen flow rate have a lesser influence on the coating wear rate.Under the process parameters of sputtering time of 240min,substrate temperature of 350℃,nitrogen flow rate of 40sccm and sputtering power of 120W,the tribological performance of CrAlN layer is better.The results of the study can provide certain reference basis and data support for the selection of CrAlN coating process for silicon nitride under dry friction application.

关 键 词：氮化硅陶瓷 干摩擦 CrAlN涂层 正交试验 工艺优化 

分 类 号：TG174.4[金属学及工艺—金属表面处理] TH16[金属学及工艺—金属学]