数字微镜器件衍射模型建立及其在激光直写机台中的应用  

Modeling of Digital Micromirror Device Diffraction Effect and ItsApplication in Laser Direct Writing Equipment

作　　者：方林 蔡健 叶加良 蔡潍 张琦 Fang Lin;Cai Jian;Ye Jialiang;Cai Wei;Zhang Qi(Circuit Fabology Microelectronics Equipment Co.,Ltd.,Hefei 230088,Anhui,China)

机构地区：[1]合肥芯碁微电子装备股份有限公司,安徽合肥230088

出　　处：《激光与光电子学进展》2024年第15期308-314,共7页Laser & Optoelectronics Progress

基　　金：安徽省科技重大专项(2021d05050004)。

摘　　要：数字微镜器件(DMD)是激光直写光刻设备(LDI)的核心光学器件。基于LDI实际生产条件建立相关衍射模型,仿真和分析不同参数下DMD频谱面衍射光斑分布和像平面成像质量的对应关系,解释同一型号的DMD投影图形对比度差异原因。首次通过改变光线入射角来调控DMD的衍射光斑分布,从而提升激光直写设备图形解析效果,解决了工艺批次带来的DMD投影图形对比度不佳问题,降低了直写光刻设备的物料成本。Digital micromirror device(DMD)is the key device of laser direct writing lithography intrusments(LDI).We establish a diffraction model of DMD based on LDI in production conditions,and analyse the relationship between the distribution of diffraction spot in the fourier plane and the image contrast in the image plane.The different performance of the image contrast using the same type DMD devices is theoretically explained,which is consistent with the exposure experiments.Additionally,we modulate the distribution of diffraction spot by adjusting the angle of the incident light and the performance of the exposure result is significantly improved.The poor image contrast of DMD caused by production batch is overcomed and the unusable DMD chips can be properly used.Thus the material cost of production is reduced.

关 键 词：数字微镜器件 直写光刻 衍射模型 图像对比度 

分 类 号：TN29[电子电信—物理电子学]