樱桃叶片发育过程中光系统活性及对激发压抗性变化的研究  

Changes of activities and resistance to excitation pressure of photosystems during the development of Prunus avium leaves

作　　者：王俊彦 张强 贾玉枝 刘洋 张迪 张佩莹 张馨月 孙山[1] 张子山[2] WANG Junyan;ZHANG Qiang;JIA Yuzhi;LIU Yang;ZHANG Di;ZHANG Peiying;ZHANG Xinyue;SUN Shan;ZHANG Zishan(Shandong Institute of Pomology,Taian,Shandong 271099,China;College of Life Sciences,Shandong Agricultural University,National Key Laboratory of Wheat Breeding,Taian,Shandong 271018,China)

机构地区：[1]山东省果树研究所,山东泰安271099 [2]山东农业大学生命科学学院,小麦育种全国重点实验室,山东泰安271018

出　　处：《植物生理学报》2024年第8期1348-1356,共9页Plant Physiology Journal

基　　金：山东省自然科学基金(ZR2023MC090);山东省重点研发计划项目(2022TZXD006)。

摘　　要：超出碳同化利用能力的过剩光能被称为激发压,会导致光抑制。本研究以‘美早’(‘Tieton’)樱桃(Prunus avium)为实验材料,通过820 nm光吸收和叶绿素荧光技术,探究叶片发育过程中光系统Ⅰ(PSⅠ)、光系统Ⅱ(PSⅡ)的活性及对激发压抗性的变化规律。PSⅠ、PSⅡ活性随樱桃叶片发育逐渐增加,幼叶PSⅠ活性远低于PSⅡ,表明PSⅡ比PSⅠ发育更早。对樱桃叶片进行持续强光或重复短脉冲光处理,分别诱导PSⅡ、PSⅠ发生光抑制,从而检测PSⅡ和PSⅠ对激发压的抗性。结果表明,随叶片发育,PSⅡ对激发压的抗性逐渐增加然后保持稳定;PSⅠ对激发压的抗性则先下降而后上升。因此,本研究表明在樱桃叶片发育过程中,PSⅠ和PSⅡ活性及对激发压抗性的发育均不是同步的,PSⅠ和PSⅡ的光保护机制可能是相对独立的。樱桃叶片发育过程中PSⅠ对激发压抗性的变化与P700氧化比例(P700+)和质体醌还原程度(F_(s)/F_(m))无关。影响樱桃叶片发育过程中光系统对激发压抗性变化的机制还有待进一步研究。The excess light energy beyond the utilization ability of photosynthetic carbon assimilation is termed excitation pressure,which can lead to photoinhibition.In this study,the changes in photosystem I(PSI)and photosystm II(PSII)activities and their resistance to excitation pressure during the development of leaves from Prunus avium‘Tieton’was analyzed by 820 nm light absorption and chlorophyll fluorescence technology.The results show that the activities of both PSI and PSII increased gradually during leaf development,and the PSI activity was much lower than PSII in young leaves,indicating that PSII develops earlier than PSI.To explore the resistance of PSI and PSII to excitation pressure,continuous high light or repeated short-pulse light treatments were applied respectively to induce PSII or PSI photoinhibition.The resistance of PSII to excitation pressure increased gradually as leaf development,while the resistance of PSI to excitation pressure initially decreased and then increased.Therefore,this study suggests that the development of PSI and PSII activities,as well as their resistance to excitation pressure,are not synchronized during leaf development.The photoprotection mechanisms of PSI and PSII may be relatively independent.The resistance of PSI to excitation pressure was not related to the P700 oxidation ratio(P700+)and plastoquinone reduction degree(F_(s)/F_(m)).Further research is needed to investigate the mechanisms under changing resistance of the PSI to excitation pressure during the development of P.avium leaves.

关 键 词：樱桃 叶片发育 光系统Ⅰ 光系统Ⅱ 激发压 抗性 

分 类 号：S662.5[农业科学—果树学]