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作 者:XINRUI ZHU YAOWEN HU SHENGYUAN LU HANA KWARNER XUDONG LI YUNXIANG SONG LETÍCIA MAGALHÃES AMIRHASSAN SHAMS-ANSARI ANDREA CORDARO NEIL SINCLAIR MARKO LONČAR
机构地区:[1]John A.Paulson School for Engineering and Applied Sciences,Harvard University,Cambridge,Massachusetts 02138,USA [2]State Key Laboratory for Mesoscopic Physics and Frontiers Science Center for Nano-optoelectronics,School of Physics,Peking University,Beijing 100871,China [3]DRS Daylight Solutions,San Diego,California 92127,USA
出 处:《Photonics Research》2024年第8期I0001-I0006,共6页光子学研究(英文版)
基 金:Defense Advanced Research Projects Agency(HR001120C0137);U.S.Navy(N68335-22-C-0413);Air Force Office of Scientific Research(FA9550-20-1-01015);Air Force Research Laboratory(FA864921P0781);National Aeronautics and Space Administration(80NSSC22K0262,80NSSC23PB442);National Science Foundation(EEC-1941583,OMA-2137723,2138068);Office of Naval Research(N00014-22-C-1041);National Institutes of Health(5R21EY031895-02);National Research Foundation of Korea。
摘 要:The recent emergence of thin-film lithium niobate(TFLN)has extended the landscape of integrated photonics.This has been enabled by the commercialization of TFLN wafers and advanced nanofabrication of TFLN such as high-quality dry etching.However,fabrication imperfections still limit the propagation loss to a few dB/m,restricting the impact of this platform.Here,we demonstrate TFLN microresonators with a record-high intrinsic quality(Q)factor of twenty-nine million,corresponding to an ultra-low propagation loss of 1.3 dB/m.We present spectral analysis and the statistical distribution of Q factors across different resonator geometries.Our work pushes the fabrication limits of TFLN photonics to achieve a Q factor within 1 order of magnitude of the material limit.
分 类 号:TN256[电子电信—物理电子学]
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